Filling device and use thereof for dispensing a fluid

ABSTRACT

The invention relates to a filling device ( 1 ) for dispensing a fluid into at least one container, where the filling device ( 1 ) has a weighing system ( 2 ) and a filling-needle system ( 3 ). The weighing system ( 2 ) has a positioning device ( 4 ) which can be adapted to a container diameter and which may have an annular design. The weighing system ( 2 ) is arranged on an accommodation platform ( 7 ) which can be moved vertically by means of a linear unit. The filling-needle system ( 3 ) is arranged on a displacement unit in a position at a distance in the axial direction above the positioning device ( 4 ).

The invention describes a filling device for dispensing a fluid, inparticular a liquid-crystal mixture, into at least one container, andthe use thereof for dispensing a liquid-crystal mixture.

Various filling devices or filling machines are known by means of whicha meterable amount of fluid can be introduced into a container. Thefluid can be, for example, liquid or flowable chemical raw materials orend products which are used in the chemical or pharmaceutical industry.The fluid may also be a liquid food or a liquid component for thepreparation of foods.

The fluid can be introduced into the container by means of afilling-needle system. Reliable metering during the filling operationcan be ensured via a weighing system.

Suitable containers which are employed in the context of industrial useare usually drums, canisters or bottles which are made from plastic,metal or glass. Containers of this type serve for the transport orstorage of the liquid introduced into the container. So-called rotarymachines, for example, are known here, in which small containers to befilled are automatically fed into a rotating conveyor device and filledwith the desired liquid or the pre-specified fluid in the fillingmachine.

The fluids are usually pumped into the container to be filled from afluid reservoir, for example from a further container, by means of apump. The containers to be filled may differ here with respect to theirsize and shape, meaning that adaptation of the filling machine to thecontainer to be filled in the individual case is regularly necessary. Itis regarded as disadvantageous here that each change in the containersize requires re-fitting of the filling device.

It is known from practice that a filling nozzle of the filling devicewhich is used for filling the containers can be displaced axially and ismoved out or in depending on the container size. The length of thesection projecting into the container can be changed and adapted torespective other container sizes. In spite of the possibility ofadjustment for the length of the filling nozzle, the use of a fillingmachine of this type is restricted, since calibration of the fillingspeed has to be carried out and in addition the containers have to bepositioned manually. For containers which have a different diameter ofthe opening intended for the introduction of the liquid, either thecontainer position must be pre-specified separately, giving rise to anadditional handling operation, or alternatively a separate fillingmachine adapted to the containers in question must be used.

Particularly in the case of the dispensing of liquid-crystal mixtures,high demands are made of the filling machine or of the fillingoperation, such as, for example, clean-room ambient conditions. Beforethe filling of the containers with liquid-crystal mixtures, thecontainers to be filled generally have to be inertised, which is usuallycarried out before arrangement of the containers in a filling positionand is subsequently followed by displacement of the containers from aninertisation position to the filling position.

It is therefore regarded as an object of the present invention to designa filling machine for dispensing liquids into a container in such a waythat the filling machine can be adapted to different containers with aslittle effort as possible and optionally offers possibilities forinertisation.

This object is achieved in accordance with the invention in that afilling device for dispensing a fluid into at least one container isprovided, where the filling device has at least one weighing system anda filling-needle system, where the weighing system has at least onecontainer positioning device which can be adapted to a containerdiameter, where the weighing system is arranged on an accommodationplatform which can be moved vertically by means of a linear unit andwhere the filling-needle system is arranged on a displacement unit in aposition at a distance in the axial direction above the positioningdevice.

For the purposes of the present invention, the term fluid is taken tomean all flowable inorganic, organic or biological systems or mixtures,for example true or colloidal solutions, suspensions, emulsions, melts,dispersions, liquid/gas dispersions or mixtures thereof. In particular,liquid-crystalline mixtures and isotropic liquid mixtures are taken tobe fluids in the sense of the invention.

The filling device can advantageously be used for dispensing aliquid-crystal mixture into at least one container, where the filling ispreferably carried out in a clean room. Owing to its advantageousdesign, the device is suitable for use in clean rooms. This has provenextremely positive, since the filling-device design according to theinvention means that it is not necessary to re-fit the filling device inthe case of a change of the containers, enabling costs and work to besaved. In particular, the possibility that inertisation and filling of acontainer can be carried out using the filling device without majormanual interventions or displacement of the container or a complexre-fitting operation being necessary has proven advantageous for use ofthe filling device, in particular in a clean room. In addition, the highquality and purity of the dispensed fluid can be retained, in particularin the case of a liquid-crystal mixture.

A filling device is provided by means of which high filling accuracy isachieved. The filling operation can be monitored by a high-precisionbalance. The weighing system containing the balance has at least onepositioning device, preferably with an annular design, for at least onecontainer. This enables not only weighing of the empty container, butalso monitoring of the filling operation itself and the amount of fluidmetered in during the filling operation. During the filling operation,the volume flow of the liquid to be introduced is preferably monitoredat specifiable intervals by a process computer integrated into theweighing system, and this actual value determined is compared with anominal value. The volume flow can be increased or reduced manually orautomatically if necessary. The change in the volume flow can take placevia a membrane valve installed upstream of the filling-needle system.Other adjustable or controllable valves are also conceivable.

In a preferred embodiment of the device, an operator unit, for example atouch-screen monitor with a reader, is connected to the filling device.Via the reader, which is designed, for example, as a barcode scanner,information or a barcode on a container to be filled or on a storagecontainer of the fluid to be dispensed can be input. This information iscompared with a database, after which adjustments specific to thefilling operation, i.e. specific to the container or specific to theproduct, can be carried out automatically on the filling device, so thatan individual filling operation can be guaranteed for different fluidsor for different containers.

In order to facilitate adaptation to the different container sizes ordrum sizes, the weighing system with the positioning device is arrangedon an accommodation platform which can be moved vertically by means of alinear unit, so that the position of the weighing system and thus of thecontainer relative to the filling-needle system can be adjusteddepending on the container to be filled, i.e. depending on its volume orsize. The accommodation platform is moved automatically to the heightrequired for the filling of the container by a machine control system ofthe linear unit. Additional detection of the empty container via thetare weight can prevent malfunctions of the filling device.

It may also be advantageous for the filling device to comprise two ormore weighing systems, where the weighing systems are each arranged on aseparate accommodation platform which can be moved vertically by meansof in each case one linear unit. The accommodation tables can becontrolled separately, enabling two containers, in particular twocontainers of different size, to be filled simultaneously by means ofthe filling device.

It is likewise possible and advantageous for certain applications toarrange two or more weighing systems on a common accommodation platform,if the filling device is used predominantly for the filling of a singlecontainer size.

In a particularly advantageous embodiment, the filling device has twoweighing systems, where the two weighing systems are each mounted on anaccommodation platform which can be moved vertically by means of in eachcase one linear unit.

The weighing system preferably has at least one container positioningdevice with an annular design. In the case of two weighing systems ormore, it is advantageously provided that each weighing system with ineach case one positioning device is arranged on the at least one movableaccommodation platform. The weighing system may in addition have auniversal positioning device, by means of which the containers can bereliably centred and positioned. This has proven advantageous, sincethis enables the filling needle to be positioned reproducibly in theopening of the containers. This universal adaptation ability of thepositioning device is provided through the positioning device consistingof a plurality of annular bulges and each bulge being intended orstandardised for a defined container size. Clamping means may also beutilised for positioning of the containers.

The containers which are particularly suitable for use with the fillingdevice are glass bottles in the sizes 0.1-0.5 l and 1 l, and steelcontainers in the size 10 l. This adaptation ability of the positioningdevice guarantees universal usability of the device and is to beregarded as an essential advantage over the filling devices known in theprior art. The filling device can of course be extended at any time withfurther positioning devices which are standardised to further containersizes. The positioning devices can advantageously be fixed on or to theweighing system by means of a non-positive or positive connection,enabling fast replacement.

It has proven advantageous if the filling device, in particular theweighing system and the volume flow, can be matched to the liquid to bedispensed and the containers. This enables product-specific fillingthrough adaptation of the filling parameters via software of the devicecontrol system. Differing properties of the fluids, in particulardifferent liquid-crystal mixtures, also require different fillingparameters. The optimum filling parameters can be determined in advancein a suitable manner in experiments and saved in a database. Duringinitialisation of the device, the product-specific data can be read invia an input device or reader, for example a barcode reader, andidentified from a barcode on the documents accompanying the batch. Fineadjustment of the parameters may in addition also be possible by hand.

Furthermore, it is advantageous to use a pump, whose control can betaken on by the filling device. The corresponding parameters arepreferably called up via the database, and, for example, the volume flowis regulated correspondingly. The filling device may also advantageouslyensure pressure regulation of a storage container and thus mediatransport.

The filling-needle system is preferably arranged on a horizontallymovable displacement unit at a distance in the axial direction above thepositioning device. The filling is preferably carried out under softwarecontrol in the steps coarse, medium and fine flow. This enables theduration of the filling operation to be minimised.

According to an advantageous embodiment of the inventive idea, it isprovided that the filling-needle system comprises a combined filling andinertisation needle. In addition, the diameters of the combined fillingand inertisation needles may have been optimised in experiments withrespect to the filling flow to be expected. Before the filling, thecontainer is preferably inertised by means of a noble gas.

For this purpose, the filling-needle system may, in addition to thefilling needle, have a second tube welded on at the side or, in anotherembodiment, a tube mounted coaxially over the filling needle. This tubeis likewise called a needle in the sense of the invention. This meansthat the filling-needle system preferably comprises a first needle forthe inertisation and a second needle for the filling. The combination ofan inertisation needle and a filling needle enables the inertisation andfilling operation to be carried out in one position, namely in thefilling device according to the invention, without displacement of thecontainer being necessary. The inertisation tube or the inertisationneedle may advantageously be somewhat tapered in a front region in orderto facilitate introduction of the needle into glass bottles havingnarrow mouths.

In a preferred embodiment of the device, the filling-needle system isarranged in a clamping block which can be removed from the displacementunit. The entire filling-needle system is preferably mounted in aclamping block and can thus be prepared and assembled outside thedevice. The clamping block can be mounted on and fixed to thedisplacement unit using attachment means known to the person skilled inthe art, in particular screws. The filling-needle system is preferablyinstalled in the clamping block using clamp connections, in particularin accordance with DIN standards 32676, 11851, 11864 and 11853. Thisguarantees rapid assembly and disassembly.

Components of the filling-needle system which may come into contact withthe respective fluid used during the filling operation preferablyconsist of stainless steel and/or polytetrafluoroethylene (PTFE).However, it may likewise be advantageous, depending on the proposedapplication, to use other metals or plastics. Plastics denote, inparticular, materials whose essential constituents consist ofmacromolecular organic compounds which are formed synthetically or bymodification of natural products. The plastics also include, inparticular, the rubbers and the synthetic fibres. For the advantageousembodiment, use can be made of plastics from the group modified naturalproducts, synthetic plastics (polycondensates, polymers, polyadditionproducts), thermosets and/or unsaturated polyester resins, includingcellulose nitrate, cellulose acetate, cellulose mixed esters, celluloseethers, polyamide, polycarbonate, polyester, polyphenylene oxide,polysulfone, polyvinylacetal, polyethylene, polypropylene,poly-1-butene, poly-4-methyl-1-pentene, ionomers, polyvinyl chloride,polyvinylidene chloride, polymethyl methacrylate, polyacrylonitrile,polystyrene, polyacetal, fluorinated plastics, polyvinyl alcohol,polyvinyl acetate, poly-p-xylylene, linear polyurethanes, chlorinatedpolyethers, casein plastics, crosslinked polyurethanes, silicone,polyimide and/or polybenzimidazole.

It may furthermore be advantageous for the components of thefilling-needle system to be made from metal, in particular fromstainless steel. Stainless steel is resistant to water, water vapour,atmospheric moisture, edible acids and to weak organic and inorganicacids and offers the filling needle good protection against manydifferent fluids. It may of course also be advantageous to make thefilling-needle system from a combination of metal and plastic.

The clamping block of the filling-needle system is attached to thedisplacement unit, where the displacement unit and in particular theclamping block can be moved at least horizontally for fine adjustment bymeans of suitable means. This enables slight inaccuracies of the needlegeometry of different needles to be compensated. The adjustment canadvantageously be carried out by hand using adjustment screws, so thatfine adjustment in the direction of the X and Z axes of thefilling-needle system is possible.

In a preferred embodiment, the filling device has a drop-catchingsystem, where the drop-catching system, which is attached to a swivelarm and includes a vessel, can be swivelled beneath the filling-needlesystem if no container is located in the positioning device or thefilling operation is complete. Dripping of liquid, in particularliquid-crystal mixture, out of the filling needle onto the weighingsystem can thus be prevented.

The filling needle is optimised with respect to its dimensions so thatit preferably projects into the opening of the container. In order toprevent dripping of liquid out of the filling-needle system in afilling-needle design of this type too, a drop-catching system adaptedthereto may be integrated. It consists, in particular, of a vessel, inparticular a collection vessel, which is mounted on a swivel arm, whichcan be moved beneath the filling-needle system automatically or manuallyafter the filling operation, i.e. as soon as the filling operation iscomplete or no container is located in the positioning device of theweighing system, the vessel can be swivelled beneath the filling-needlesystem. This enables dripping of liquid onto the weighing system to bereliably prevented.

A filter unit for filtration of the fluid to be dispensed isadvantageously installed upstream of the membrane valve used to controlthe volume flow. Before the filling, all the liquid to be dispensed ispreferably filtered through a filter unit. A filter unit of this typecan, for example, be mounted on the side of the device in acorresponding filter holder and may include an ultrafine filter. Thefilter is preferably attached to a quick-change filter holder in areadily accessible manner. It can advantageously be prepared beforeattachment and subsequently mounted on the filter holder, preferably viaa clamp connection.

In order to prevent undesired effects due to electrostatic charging ofthe liquid, in particular the liquid-crystal mixture, during the fillingoperation, ionisers are in a preferred embodiment of the deviceinstalled laterally, above and/or below the filling-needle system andemit a directed stream of ionised air against the filling-needle systemand/or the filling region. This enables, in particular, effects such asa liquid-crystal mixture flowing past the opening or mouth of thecontainer to be filled due to electrostatic charging to be substantiallyprevented.

It may furthermore be advantageous for protective walls having anantistatic coating to be arranged laterally to the filling-needlesystem. The protective walls are preferably earthed. The protectivewalls enable any interfering electrostatic effects otherwise possiblyoccurring owing to the laminar flow of the fluid to be dispensed to bereduced or even entirely prevented.

In the following list, various features and advantages of the fillingdevice according to the invention are summarised:

-   -   high filling accuracy (in particular −0%/+0.3 −0.03%);    -   high filling speed including inertisation of the container, in        particular 0.5 l in 30 seconds;    -   use of glass bottles of different dimensions and in particular        10 l containers on one device possible;    -   filling-needle system which is easy to disassemble and clean;    -   inertisation of the containers before filling;    -   filtration of the filling medium, in particular the liquid,        before filling;    -   fine adjustment of the filling-needle system via the        displacement unit possible;    -   integrated ionisers for ionisation of the filling point in order        to reduce electrostatic effects;    -   drop-catching system for preventing contamination and incorrect        measurements of the device by dripping liquid, in particular        liquid-crystal mixture;    -   product-specific filling by adaptation of the filling parameters        via the software of the device control system.

Further advantageous embodiments are explained in greater detail withreference to an illustrative embodiment depicted in the drawing, inwhich:

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 shows an illustrative depiction of a filling device according tothe invention, and

FIG. 2 shows an illustrative depiction of a filling-needle system forthe filling device shown in FIG. 1.

FIG. 1 shows a diagrammatic representation of a preferred filling device1. The filling device 1 comprises two separate weighing systems 2, twofilling-needle systems 3, two positioning devices 4 which can be adaptedto a container diameter, and two drop-catching systems 5.

The container positioning device 4 has an annular design and has bulgesof different size, so that containers having different sizes ordiameters can be introduced and fixed reliably in the respectivepositioning device.

In order to enable the two weighing systems 2 to be moved vertically,the two weighing systems 2 are arranged on an accommodation platform 7which can be moved vertically by means of a linear unit 6. The twoweighing systems 2 can be adapted uniformly to different container sizesby means of the common accommodation platform 7, where automatic ormanual displacement of the accommodation platform 7 can take place.

In the case where a plurality of containers of different size are to befilled independently of one another and if possible simultaneously withone or more fluids, each weighing system 2 could, contrary to theillustrative variant depicted by way of example, be arranged on anassigned accommodation platform 7 each, where the accommodation tables 7can be moved vertically independently of one another by means of in eachcase one linear unit 6. This enables the accommodation tables 7 to bemoved into different positions, enabling the filling of differentcontainer sizes.

The filling-needle systems 3 are each arranged in a position at adistance in the axial direction above the positioning devices 4 on adisplacement unit 8 which can be moved horizontally. This enables eachfilling-needle system 3 and the assigned weighing system 2 to be adaptedto different container sizes. The adjustment of the filling-needlesystem 3 takes place via a fine adjustment which enables horizontaldisplacement of the system 3 in the X and Z directions. Simultaneoushorizontal and vertical movability of the filling-needle system 3 mayoptionally also be provided. It has been found that this enables it tobe ensured that the filling-needle system 3 penetrates to an optimumextent into the opening of a container and efficient and lossfreefilling is possible.

In order to prevent fluid residues dripping out of the filling-needlesystem 3 onto the weighing system 2 after filling of a container, thedrop-catching system 5, which is attached to a swivel arm and includes avessel, can advantageously be swivelled beneath the associatedfilling-needle system 3 after filling. It can thus be ensured that theweighing system 2 is not contaminated by fluid residues and the weighingof a current or future filling operation is thereby falsified. Thedrop-catching system 5 may of course also be designed in such a way thatit swivels automatically beneath the filling-needle system 3 as soon asor if no container is located in the positioning device 4.

Before filling of a container located in the positioning device 4, thefluid to be dispensed is advantageously purified using a filter unit 9.The filter unit 9, preferably an ultrafine filter, can be mounted on theside of the filling device 1 in a filter holder 10. The filter unit 9can be prepared before beginning the filling and inserted rapidly intothe filter holder 10, in particular via clamp connections.

Different properties of the fluids and in particular liquid-crystalmixtures to be dispensed require adaptation of the filling to thediffering properties of the fluids in question. The specific fillingparameters, such as, for example, adjustment of the weighing system, thecontainer size, a filling speed and optionally ionisation, can bedetermined in advance and stored in a database. During initialisation ofthe filling device, these parameters can be input into the fillingdevice 1, for example via a touch-screen monitor 11. The filling device1 subsequently automatically adjusts all relevant parameterscorrespondingly. However, it may also be advantageous for theproduct-specific data to be input via a reader, for example a barcodereader (not depicted), from a barcode on documents accompanying thebatch, on containers to be filled or on a storage container of the fluidto be dispensed. The barcode reader can thus be an advantageoussupplement of the filling device 1 and may be connected, for example, tothe touch-screen monitor 11. The filling device 1 is arranged in aswitching cabinet 15, which also accommodates circuitry of supply anddischarge lines of the filling device 1.

Side walls 16 which have an antistatic coating may be arranged laterallyalongside the weighing systems 2 or alongside the filling-needle systems3, so that electrostatic charges formed by a laminar flow of the liquidto be dispensed are prevented.

FIG. 2 shows an enlarged representation of the filling-needle system 3.The filling-needle system 3 comprises a combined filling andinertisation needle 12. Filling and inertisation of a container are thuspossible using the filling-needle system 3 of the filling device withoutthe container having to be transported to a further station for thispurpose.

The filling-needle system 3 is fixed in a clamping block 13 and may beassembled outside the filling device 1. The clamping block 13 can bemounted on the displacement unit (not depicted in FIG. 2) usingattachment means, for example screws. The installation of thefilling-needle system 3 in the clamping block 13 is carried out in anadvantageous manner by means of clamp connections, enabling rapidassembly and disassembly. The filling-needle system 3 may furthermorehave screws 14 for the fine adjustment of the filling-needle system 3 onthe displacement unit, so that the position of the combined filling andinertisation needle 12 in the opening of a container is achieved. Thefine adjustment preferably enables the filling-needle system 3 and/orthe clamping block 13 to be moved horizontally and/or vertically on thedisplacement unit.

The filling device described above is particularly suitable forliquid-crystal mixtures. In particular, liquid-crystal mixturescomprising at least two organic substances, preferably mesogenic, inparticular liquid-crystalline substances, are used here, where theorganic substances are preferably selected from the compounds of thegeneral formula I,

in which

-   R¹ and R² each, independently of one another, denote H, an alkyl    radical having up to 15 C atoms which is unsubstituted,    monosubstituted by CN or CF₃ or at least monosubstituted by halogen,    where, in addition, one or more CH₂ groups in these radicals may be    replaced by —O—, —S—,

—C≡C—, —CH═CH—, —CF₂O—, —OCF₂—, —OC—O— or —O—CO— in such a way that 0atoms are not linked directly to one another, and one of the radicals R¹and R² also denotes F, Cl, CN, SF₅, NCS, SCN, OCN,

-   rings A, B, C, D and E each, independently of one another, denote

-   r, s and t each, independently of one another, denote 0, 1, 2 or 3,    where r+s+t≤3,-   Z¹⁻⁴ each, independently of one another, denote —CO—O—, —O—CO—,    —CF₂O—, —OCF₂—, —CH₂O—, —OCH₂—, —CH₂CH₂—, —(CH₂)₄—, —CH═CH—CH₂O—,    —C₂F₄—, —CH₂CF₂—, —CF₂CH₂—, —CF═CF—, —CH═CF—, —CF═CH—, —CH═CH—,    —C≡C— or a single bond, and-   L¹ and L² each, independently of one another, denote H or F.

In the case where r+s+t=0, Z¹ and Z⁴ are preferably selected in such away that, if they do not denote a single bond, they are not linked toone another via two O atoms.

The liquid-crystal mixtures employed comprising the individual mesogenicsubstances may additionally also comprise one or more polymerisablecompounds, so-called reactive mesogens (RMs), for example as disclosedin U.S. Pat. No. 6,861,107, in concentrations of, preferably, 0.12-5% byweight, particularly preferably 0.2-2% by weight, based on the mixture.Mixtures of this type can be used for so-called polymer stabilised VA(PS-VA) modes, negative IPS (PS-IPS) or negative FFS (PS-FFS) modes, inwhich polymerisation of the reactive mesogens is intended to take placein the liquid-crystalline mixture. The prerequisite for this is that theliquid-crystal mixture does not itself comprise any individualpolymerisable substances.

The polymerisable mesogenic or liquid-crystalline compounds, also knownas “reactive mesogens” (RMs), are preferably selected from the compoundsof the formula IIR^(a)-A¹-(Z¹-A²)_(m)-R^(b)  IIin which the individual radicals have the following meanings:

-   A¹ and A² each, independently of one another, denote an aromatic,    heteroaromatic, alicyclic or heterocyclic group, preferably having 4    to 25 C atoms, which may also contain fused rings and which is    optionally mono- or polysubstituted by L,-   Z¹ on each occurrence, identically or differently, denotes —O—, —S—,    —CO—, —CO—O—, —OCO—, —O—CO—O—, —OCH₂—, —CH₂O—, —SCH₂—, —CH₂S—,    —CF₂O—, —OCF₂—, —CF₂S—, —SCF₂—, —(CH₂)_(n)—, —CF₂CH₂—, —CH₂CF₂—,    —(CF₂)_(n)—, —CH═CH—, —CF═CF—, —C≡C—, —CH═CH—COO—, —OCO—CH═CH—,    CR⁰R⁰⁰ or a single bond,-   L, R^(a) and R^(b) each, independently of one another, denote H,    halogen, SF₅, NO₂, a carbon group or hydrocarbon group, where the    compounds contain at least one radical L, R^(a) and R^(b) which    denotes or contains a P-Sp-group,-   R⁰ and R⁰⁰ each, independently of one another, denote H or alkyl    having 1 to 12 C atoms,-   P denotes a polymerisable group,-   Sp denotes a spacer group or a single bond,-   m denotes 0, 1, 2, 3 or 4,-   n denotes 1, 2, 3 or 4.

The polymerisable compounds may contain one polymerisable group(monoreactive) or two or more (di- or multireactive), preferably two,polymerisable groups.

Above and below, the following meanings apply:

The term “mesogenic group” is known to the person skilled in the art andis described in the literature, and denotes a group which, due to theanisotropy of its attracting and repelling interactions, essentiallycontributes to causing a liquid-crystal (LC) phase inlow-molecular-weight or polymeric substances. Compounds containingmesogenic groups (mesogenic compounds) do not necessarily have to havean LC phase themselves. It is also possible for mesogenic compounds toexhibit LC phase behaviour only after mixing with other compounds and/orafter polymerisation. Typical mesogenic groups are, for example, rigidrod- or disc-shaped units. An overview of the terms and definitions usedin connection with mesogenic or LC compounds is given in Pure Appl.Chem. 73(5), 888 (2001) and C. Tschierske, G. Pelzl, S. Diele, Angew.Chem. 2004, 116, 6340-6368.

The term “spacer group”, also referred to as “Sp” above and below, isknown to the person skilled in the art and is described in theliterature, see, for example, Pure Appl. Chem. 73(5), 888 (2001) and C.Tschierske, G. Pelzl, S. Diele, Angew. Chem. 2004, 116, 6340-6368.Unless indicated otherwise, the term “spacer group” or “spacer” aboveand below denotes a flexible group which connects the mesogenic groupand the polymerisable group(s) in a polymerisable mesogenic compound(“RM”) to one another. Sp preferably denotes a single bond or a 1-16 Calkylene, in which one or more CH₂ groups may be replaced by —O—, —CO—,—COO— or —OCO— in such a way that two O atoms are not connected directlyto one another.

The term “organic group” denotes a carbon or hydrocarbon group.

The term “carbon group” denotes a mono- or polyvalent organic groupcontaining at least one carbon atom which either contains no furtheratoms (such as, for example, —C≡C—) or optionally contains one or morefurther atoms, such as, for example, N, O, S, P, Si, Se, As, Te or Ge(for example carbonyl, etc.). The term “hydrocarbon group” denotes acarbon group which additionally contains one or more H atoms andoptionally one or more heteroatoms, such as, for example, N, O, S, P,Si, Se, As, Te or Ge.

“Halogen” denotes F, Cl, Br or I.

The terms “alkyl”, “aryl”, “heteroaryl”, etc., also encompass polyvalentgroups, for example alkylene, arylene, heteroarylene, etc.

The term “alkyl” in this application encompasses straight-chain andbranched alkyl groups having 1 to 9 carbon atoms, preferably thestraight-chain groups methyl, ethyl, propyl, butyl, pentyl, hexyl,heptyl, octyl and nonyl. Groups having 1 to 5 carbon atoms areparticularly preferred.

The term “alkenyl” in this application encompasses straight-chain andbranched alkenyl groups having 2 to 9 carbon atoms, preferably thestraight-chain groups having 2 to 7 carbon atoms. Particularly preferredalkenyl groups are C₂-C₇-1E-alkenyl, C₄-C₇-3E-alkenyl, C₅-C₇-4-alkenyl,C₆-C₇-5-alkenyl and C₇-6-alkenyl, in particular C₂-C₇-1E-alkenyl,C₄-C₇-3E-alkenyl and C₅-C₇-4-alkenyl. Examples of preferred alkenylgroups are vinyl, E-propenyl, 1E-butenyl, 1E-pentenyl, 1E-hex-enyl,1E-hept-enyl, 3-butenyl, 3E-pentenyl, 3E-hexenyl, 3E-heptenyl,4-pentenyl, 4Z-hexenyl, 4E-hexenyl, 4Z-hep-tenyl, 5-hexenyl, 6-heptenyland the like. Groups having up to 5 carbon atoms are particularlypreferred.

The term “fluoroalkyl” in this application encompasses straight-chaingroups having a terminal fluorine, i.e. fluoromethyl, 2-fluoroethyl,3-fluoropropyl, 4-fluoro-butyl, 5-fluoro-pentyl, 6-fluorohexyl and7-fluoroheptyl. However, other positions of the fluorine are notexcluded.

The term “oxaalkyl” or “alkoxy” in this application encompassesstraight-chain radicals of the formula C_(n)H_(2n+1)—O—(CH₂)_(m), inwhich n and m each, independently of one another, denote 1 to 6.Preferably, n=1 and m=1 to 6.

The term “aryl” denotes an aromatic carbon group or a group derivedtherefrom. The term “heteroaryl” denotes “aryl” in accordance with theabove definition containing one or more heteroatoms.

The polymerisable group P is a group which is suitable for apolymerisation reaction, such as, for example, free-radical or ionicchain polymerisation, polyaddition or polycondensation, or for apolymer-analogous reaction, for example addition or condensation onto amain polymer chain. Particular preference is given to groups for chainpolymerisation, in particular those containing a C≡C double bond or a—C≡C— triple bond, and groups which are suitable for polymerisation withring opening, such as, for example, oxetane or epoxide groups.

The polymerisable compounds are prepared analogously to processes whichare known to the person skilled in the art and are described in standardworks of organic chemistry, such as, for example, in Houben-Weyl,Methoden der organischen Chemie [Methods of Organic Chemistry],Thieme-Verlag, Stuttgart.

Typical and preferred reactive mesogens (RMs) are described, forexample, in WO 93/22397, EP 0 261 712, DE 195 04 224, WO 95/22586, WO97/00600, U.S. Pat. No. 5,518,652, U.S. Pat. No. 5,750,051, U.S. Pat.No. 5,770,107 and U.S. Pat. No. 6,514,578. Very particularly referredreactive mesogens are shown on Table E.

The process is used for the preparation of a mixture consisting oforganic compounds, one or more of which are preferably mesogenic,preferably liquid-crystalline, per se. The mesogenic compoundspreferably include one or more liquid-crystalline compounds. The processproduct is preferably a homogeneous, liquid-crystalline mixture. In thebroader sense, the process also encompasses the preparation of mixtureswhich consist of organic substances in the homogeneous liquid phase andcomprise additives which are insoluble therein (for example smallparticles). The process can thus also be used for the preparation ofsuspension-like or emulsion-like mixtures based on a continuoushomogeneous organic phase. However, process variants of this type aregenerally less preferred.

By means of suitable additives, the liquid-crystal phases according tothe invention can be modified in such a way that they can be employed inany type of LCD display that has been disclosed to date, for example,ECB, VAN, IPS, FFS, TN, TN-TFT, STN, OCB, GH, PS-IPS, PS-FFS, PS-VA orASM-VA displays.

The liquid-crystal mixtures may also comprise further additives known tothe person skilled in the art and described in the literature, such as,for example, UV stabilisers, such as, for example, Tinuvin® from Ciba,antioxidants, free-radical scavengers, nanoparticles, microparticles,one or more dopants, etc. For example, 0-15% of pleochroic dyes may beadded, furthermore conductive salts, preferablyethyldimethyldodecylammonium 4-hexoxybenzoate, tetrabutylammoniumtetraphenylboranate or complex salts of crown ethers (cf., for example,Haller et al., Mol. Cryst. Liq. Cryst. Volume 24, pages 249-258 (1973))in order to improve the conductivity, or substances can be added inorder to modify the dielectric anisotropy, the viscosity and/or thealignment of the nematic phases. Substances of this type are described,for example, in DE-A 22 09 127, 22 40 864, 23 21 632, 23 38 281, 24 50088, 26 37 430 and 28 53 728.

Suitable stabilisers and dopants which can be combined with thecompounds of the formula I in the mixing container in the preparation ofthe liquid-crystal mixtures are indicated below in Tables C and D.

The following examples are intended to explain the invention withoutlimiting it. Above and below, percentages are percent by weight and alltemperatures are indicated in degrees Celsius.

Throughout the patent application, 1,4-cyclohexylene rings and1,4-phenylene rings are depicted as follows:

The cyclohexylene rings are trans-1,4-cyclohexylene rings.

In the present application and in the following examples, the structuresof the liquid-crystal compounds are indicated by means of acronyms, withthe transformation into chemical formulae taking place in accordancewith Tables A and B below. All radicals C_(n)H_(2n+1) and C_(m)H_(2m+1)are straight-chain alkyl radicals having n and m C atoms respectively;n, m, k and z are integers and preferably denote 0, 1, 2, 3, 4, 5, 6, 7,8, 9, 10, 11 or 12. The term “(O)C_(m)H_(2m+1)” means OC_(m)H_(2m+1) orC_(m)H_(2m+1). The coding in Table B is selfevident.

In Table A, only the acronym for the parent structure is indicated. Inindividual cases, this is followed, separated from the acronym for theparent structure by a dash, by a code for the substituents R¹*, R²*, L¹*and L²*:

Code for R¹*, R²*, L¹*, L²*, L³* R¹* R²* L¹* L²* nm C_(n)H_(2n+1)C_(m)H_(2m+1) H H nOm C_(n)H_(2n+1) OC_(m)H_(2m+1) H H nO · mOC_(n)H_(2n+1) C_(m)H_(2m+1) H H n C_(n)H_(2n+1) CN H H nN · FC_(n)H_(2n+1) CN F H nN · F · C_(n)H_(2n+1) CN F F F nF C_(n)H_(2n+1) FH H nCl C_(n)H_(2n+1) Cl H H nOF OC_(n)H_(2n+1) F H H nF · FC_(n)H_(2n+1) F F H nF · F · C_(n)H_(2n+1) F F F F nOCF₃ C_(n)H_(2n+1)OCF₃ H H nOCF₃ · C_(n)H_(2n+1) OCF₃ F H F n-Vm C_(n)H_(2n+1)—CH═CH—C_(m)H_(2m+1) H H nV-Vm C_(n)H_(2n+1)—CH═CH— —CH═CH—C_(m)H_(2m+1)H H

Preferred mesogenic or liquid-crystalline substances which are suitablefor the preparation of liquid-crystal mixtures and can be used in thepurification process according to the invention are listed, inparticular, in Tables A and B:

TABLE A

PYP

PYRP

BCH

CBC

CCH

CCP

CPTP

CEPTP

ECCP

CECP

EPCH

PCH

CH

PTP

CCPC

CP

BECH

EBCH

CPC

B

FET-nF

CGG

CGU

CFU

TABLE B

APU-n-OXF

ACQU-n-F

CPU-n-OXF

APUQU-n-F

BCH-n•Fm

CFU-n-F

CBC-nmF

CCP-nOCF₃

CCP-nOCF₃•F

ECCP-nm

CCZU-n-F

ECCP-nOCF₃

ECCP-nF•F

PGP-n-m

CGU-n-F

CGUQU-n-F

CLUQU-n-F

CDUQU-n-F

CDU-n-F

DCU-n-F

CGG-n-F

CPZG-n-OT

CC-nV-Vm

CCP-Vn-m

CCG-V-F

CCP-nV-m

CC-n-V

CCQU-n-F

CC-n-Vm

CPPC-nV-Vm

CCQG-n-F

CQU-n-F

CP-1V-m

CP-2V-m

CP-V2-m

CP-1V-N

CP-V2-N

CCP-nF

CCP-nF•F

BCH-nF•F•F

CCP-nF•F•F

BCH-nF•F

Dec-U-n-F

CWCU-n-F

CPGP-n-m

CWCG-n-F

GPP-n-m

CCOC-n-m

CPTU-n-F

GPTU-n-F

PQU-n-F

PUQU-n-F

PGU-n-F

CGZP-n-OT

PGU-n-OXF

CCGU-n-F

CUQU-n-F

CCCQU-n-F

CPGU-n-OT

CPGU-n-F

CVCP-1V-OT

GGP-n-Cl

PP-nV-Vm

PP-1-nVm

CWCQU-n-F

PPGU-n-F

PGUQU-n-F

GPQU-n-F

MPP-n-F

PGP-n-kVm

PP-n-kVm

PCH-nCl

GP-n-Cl

PCH-nF

PCH-n

PCH-nN•F•F

GGP-n-F

PGIGI-n-F

AlK-n-F

BCH-nm

BCH-nF/CPP-n-F

BCN-nm

CY-n-Om/PCH-nOmFF

CP(F,Cl)n-Om

CP(Cl,F)-n-Om

CCY-n-Om

CCY-n-m

CAIY-n-Om

CAIY-n-m

CCP(Cl,F)-n-Om

CCP(F,Cl)n-Om

CCY-V-m

CCY-Vn-m

CCY-V-Om

CCY-Vn-Om

CCY-n-OmV

CBC-nm

CCP-V-m

CCP-Vn-m

CCP-n-m/CCP-nm

CPYC-n-m

CYYC-n-m

CCYY-n-(O)m

CCY-n-O2V

CY-n-m

CCH-nm/CC-n-m

CCH-nOm/CC-n-Om

CEY-n-Om

CC-n-V1

CY-n-OV

CC-2V-V2

CVC-n-m

CC-n-mV

CC-n-mV1

CP-nOmFF

CH-nm

CEY-V-n

CVY-V-n

CY-V-On

CY-n-OC(CH₃)═CH₂

CY-n-O1V

CCN-nm

CY-1V-O1V

CCPC-nm

CCY-n-zOm

CPY-n-m

CPY-n-Om

CPY-V-Om

CPP(Cl,F)-n-(O)m

CPY-1V-Om

CQY-n-(O)m

CPP(F,Cl)n-(O)m

CQIY-n-(O)m

CCQY-n-(O)m

CCQIY-n-(O)m

CPQY-n-(O)m

CPQIY-n-(O)m

CPYG-n-(O)m

CCY-V-Om

D-nOmFF

MEnN•F

CY-nV-Om

PCH-nm/CP-n-m

CY-zVn-Om

PY-zVn-Om

PY-V-Om

PY-1V-Om

PCH-nOm/CP-n-Om

DPGU-n-F

DPGU-n-OT

PP-n-m

PYP-n-mV

CYLI-n-m

CENap-n-Om

LY-n-(O)m

CCNap-n-Om

CNap-n-Om

YPY-n-mV

CETNap-n-Om

CTNap-n-Om

CK-n-F

YPY-n-m

LYLI-n-m

C-DFDBF-n-(O)m

B-nO-Om

CPYG-n-(O)m

DFDBC-n(O)-(O)m

CCY-V2-(O)m

CCY-1V2-(O)m

CCY-3V-(O)m

PYP-nF

MUQU-n-F

NUQU-n-F

COChrom-n-Om

COChrom-n-m

CCOChrom-n-Om

CCOChrom-n-m

CONaph-n-Om

CCONaph-n-Om

CLY-n-Om

CLY-n-m

LYLI-n-m

CYLI-n-m

LY-n-(O)m

COYOICC-n-m

COYOIC-n-V

CCOY-V-O2V

CCOY-V-O3V

COY-n-Om

CCOY-n-Om

PGIY-n-Om

PYP-n-m

PYP-n-Om

YPY-n-m

YPY-n-mV

Y-nO-Om

Y-n-Om

PY-n-m

PY-n-Om

PY-V2-Om

C-DFDBF-n-(O)m

DFDBC-n(O)-(O)m

DFDBC-n(O)-(O)m

CPU-n-VT

CPU-n-AT

DGUQU-n-F

C-n-V

C-n-XF

C-n-m

CC-n-2V1

CCVC-n-V

DPGU-n-OT

PTP-nOm

PTP-nm

CPTP-nOm

PTP-nOmFF

CPTP-nOmFF

CPTP-n-m

PPTUI-n-m (n = 1-15; (O)C_(n)H_(2n+1) means C_(n)H_(2n+1) orOC_(n)H_(2n+1))

Particular preference is given to liquid-crystalline mixtures whichcomprise at least one, two, three, four or more compounds from Table Bbesides one or more compounds of the formula I.

TABLE C Table C indicates possible dopants, which are generally added tothe liquid-crystalline mixtures. The mixtures preferably comprise 0-10%by weight, in particular 0.01-5% by weight and particularly preferably0.01-3% by weight, of dopants.

  C 15

  CB 15

  CM 21

  R/S-811

  CM 44

  CM 45

  CM 47

  CN

  R/S-2011

  R/S-3011

  R/S-4011

  R/S-5011

  R/S-1011

Stabilisers, which can be added, for example, to the liquid-crystallinemixtures in amounts of 0-10% by weight, are shown below.

TABLE D Stabilizers, which can be added, for example, to theliquid-crystalline mixtures in amounts of 0-10% by weight, are shownbelow.

  n = 1, 2, 3, 4, 5, 6 or 7

  n = 1, 2, 3, 4, 5, 6 or 7

  n = 1, 2, 3, 4, 5, 6 or 7

(n = 1-12)

Suitable polymerisable compounds (reactive mesogens) for use in themixtures according to the invention, preferably in PSA and PS-VAapplications or PS-IPS/FFS applications, are shown below in Table E:

TABLE E Table E shows example compounds which can preferably be used asreactive mesogenic compounds in the liquid-crystalline mixturesaccording to the invention. If the liquid-crystalline mixtures compriseone or more reactive compounds, they are preferably employed in amountsof 0.01-5% by weight. It may be necessary also to add an initiator or amixture of two or more initiators for the polymerisation. The initiatoror the initiator mixture is preferably added in amounts of 0.001-2% byweight, based on the mixture. A suitable initiator is, for example,Irgacure (BASF) or Irganox (BASF).

RM-1

RM-2

RM-3

RM-4

RM-5

RM-6

RM-7

RM-8

RM-9

RM-10

RM-11

RM-12

RM-13

RM-14

RM-15

RM-16

RM-17

RM-18

RM-19

RM-20

RM-21

RM-22

RM-23

RM-24

RM-25

RM-26

RM-27

RM-28

RM-29

RM-30

RM-31

RM-32

RM-33

RM-34

RM-35

RM-36

RM-37

RM-38

RM-39

RM-40

RM-41

RM-42

RM-43

RM-44

RM-45

RM-46

RM-47

RM-48

RM-49

RM-50

RM-51

RM-52

RM-53

RM-54

RM-55

RM-56

RM-57

RM-58

RM-59

RM-60

RM-61

RM-62

RM-63

RM-64

RM-65

RM-66

RM-67

RM-68

RM-69

RM-70

RM-71

RM-72

RM-73

RM-74

RM-75

RM-76

RM-77

RM-78

RM-79

RM-80

RM-81

RM-82

RM-83

RM-84

RM-85

RM-86

RM-87

RM-88

RM-89

RM-90

RM-91

RM-92

RM-93

RM-94

RM-95

Table E shows example compounds which can preferably be used as reactivemesogenic compounds in the liquid-crystalline mixtures according to theinvention. If the liquid-crystalline mixtures comprise one or morereactive compounds, they are preferably employed in amounts of 0.01-5%by weight. It may be necessary also to add an initiator or a mixture oftwo or more initiators for the polymerisation. The initiator or theinitiator mixture is preferably added in amounts of 0.001-2% by weight,based on the mixture. A suitable initiator is, for example, Irgacure(BASF) or Irganox (BASF).

In a preferred embodiment, the liquid-crystalline mixtures comprise oneor more compounds selected from the group of the compounds from Table E.

EXAMPLES

The following working examples are intended to explain the inventionwithout restricting it.

Above and below, percent data denote percent by weight. All temperaturesare indicated in degrees Celsius. m.p. denotes melting point,cl.p.=clearing point. Furthermore, C=crystalline state, N=nematic phase,S=smectic phase and I=isotropic phase. The data between these symbolsrepresent the transition temperatures. Furthermore,

-   V_(o) denotes threshold voltage, capacitive [V] at 20° C.-   Δn denotes the optical anisotropy measured at 20° C. and 589 nm-   Δ∈ denotes the dielectric anisotropy at 20° C. and 1 kHz-   cl.p. denotes clearing point [° C.]-   K₁ denotes elastic constant, “splay” deformation at 20° C., [pN]-   K₃ denotes elastic constant, “bend” deformation at 20° C., [pN]-   γ₁ denotes rotational viscosity measured at 20° C. [mPa·s],    determined by the rotation method in a magnetic field-   LTS denotes low-temperature stability (nematic phase), determined in    test cells.

The following examples are intended to explain the invention withoutlimiting it.

Above and below, percentages are percent by weight. All temperatures areindicated in degrees Celsius.

Working Examples Example 1

A liquid-crystalline mixture, preferably for PS-VA applications, of thecomposition

CCH-35 9.47% CCH-501 4.99% CCY-2-1 9.47% CCY-3-1 10.47% CCY-3-O2 10.47%CCY-5-O2 9.47% CPY-2-O2 11.96% CY-3-O4 8.97% CY-5-O4 10.97% RM-1 0.30%PCH-53 13.46%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 2

A liquid-crystalline mixture, preferably for PS-VA applications, of thecomposition

BCH-32 7.48% CCH-23 21.93% CCH-34 3.49% CCY-3-O3 6.98% CCY-4-O2 7.98%CPY-2-O2 10.97% CPY-3-O2 10.97% CY-3-O2 15.45% RM-1 0.30% PCH-301 12.46%PCH-302 1.99%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 3

A liquid-crystalline mixture, preferably for PS-VA applications, of thecomposition

CC-3-V1 7.98% CCH-23 17.95% CCH-34 3.99% CCH-35 6.98% CCP-3-1 4.99%CCY-3-O2 12.46% CPY-2-O2 7.98% CPY-3-O2 10.97% CY-3-O2 15.45% RM-1 0.30%PY-3-O2 10.97%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 4

A liquid-crystalline mixture, preferably for PS-VA applications, of thecomposition

CC-3-V1 8.97% CCH-23 12.96% CCH-34 6.23% CCH-35 7.73% CCP-3-1 3.49%CCY-3-O2 12.21% CPY-2-O2 6.73% CPY-3-O2 11.96% CY-3-O2 11.47% RM-1 0.30%PP-1-2V1 4.24% PY-3-O2 13.71%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 5

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

CBC-33 3.50% CC-3-V 38.00% CC-3-V1 10.00% CCP-V-1 3.00% CCP-V2-1 9.00%PGP-2-3 5.00% PGP-2-4 5.00% PGU-2-F 8.00% PGU-3-F 9.00% PUQU-3-F 9.50%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 6

A liquid-crystalline mixture, preferably for IPS or FFS applications, ofthe composition

APUQU-3-F 4.50% CC-3-V 44.00% CC-3-V1 12.00% CCP-V-1 11.00% CCP-V2-19.00% PGP-2-3 6.00% PGUQU-3-F 6.00% PP-1-2V1 7.00% PPGU-3-F 0.50%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 7

A liquid-crystalline mixture, preferably for IPS or FFS applications, ofthe composition

APUQU-3-F 8.00% CBC-33 3.00% CC-3-V 34.00% CC-3-V1 2.50% CCGU-3-F 4.00%CCP-30CF₃ 4.00% CCP-3F.F.F 4.50% CCP-50CF₃ 3.00% CCP-V-1 10.00% CCQU-3-F10.00% CPGU-3-OT 6.00% PGUQU-3-F 4.00% PUQU-3-F 7.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 8

A liquid-crystalline mixture, preferably for IPS or FFS applications, ofthe composition

APUQU-2-F 5.00% APUQU-3-F 7.50% BCH-3F.F.F 7.00% CC-3-V 40.50% CC-3-V16.00% CCP-V-1 9.50% CPGU-3-OT 5.00% PGP-2-3 6.00% PGP-2-4 6.00% PPGU-3-F0.50% PUQU-3-F 7.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 9

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

APUQU-2-F 8.00% APUQU-3-F 8.00% BCH-32 7.00% CC-3-V 43.00% CCP-V-1 9.00%PGP-2-3 7.00% PGP-2-4 6.00% PUQU-2-F 5.00% PUQU-3-F 7.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 10

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

BCH-5F.F 8.00% CBC-33F 3.00% CC-3-V 22.00% CCGU-3-F 6.00% CCP-3F.F.F8.00% CCP-5F.F.F 4.00% CCP-V-1 13.00% CCP-V2-1 11.00% CCQU-3-F 5.00%CCQU-5-F 4.00% PUQU-3-F 16.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 11

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

CBC-33F 3.00% CBC-53F 3.00% CC-3-V 17.00% CC-3-V1 4.00% CCP-3F.F.F 8.00%CCPC-33 3.00% CCPC-34 3.00% CCP-V-1 5.00% CCP-V2-1 2.00% CCQU-2-F 1.50%CCQU-3-F 10.00% CCQU-5-F 10.00% CGU-3-F 6.00% PGP-2-3 7.50% PP-1-2V17.00% PUQU-3-F 10.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 12

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

APUQU-2-F 1.00% BCH-3F.F.F 15.00% CC-3-V 33.50% CC-3-V1 2.00% CCGU-3-F1.00% CCPC-33 2.00% CCP-V-1 4.50% BCH-2F 5.00% BCH-3F 5.00% PGP-2-38.50% PGUQU-3-F 7.80% PP-1-2V1 11.00% PPGU-3-F 0.20% PUQU-3-F 3.50%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 13

A liquid-crystalline mixture, preferably for IPS or FFS applications, ofthe composition

APUQU-2-F 2.00% APUQU-3-F 6.00% CC-3-V 42.00% CCP-3-1 3.00% CCP-3-33.00% CCP-3F.F.F 8.00% CCP-V-1 1.50% CCQU-3-F 7.00% CCQU-5-F 3.00%CPGU-3-OT 6.50% PGUQU-3-F 5.00% PGUQU-4-F 4.00% PGUQU-5-F 4.00% PPGU-3-F0.50% PUQU-3-F 4.50%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 14

A liquid-crystalline mixture, preferably for TN-TFT applications, of thecomposition

CC-3-V 49.50% CCP-3-1 1.50% CCP-V-1 6.00% CPGU-3-OT 7.00% PGP-2-3 8.50%PGP-2-4 5.50% PGUQU-3-F 7.00% PGUQU-4-F 4.00% PP-1-2V1 2.50% PPGU-3-F0.50% PUQU-3-F 8.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 15

A liquid-crystalline mixture, preferably for VA applications, of thecomposition

BCH-32 6.00% CCH-23 18.00% CCH-34 8.00% CCP-3-1 12.00% CCP-3-3 3.00%CCY-3-O2 6.00% CPY-2-O2 6.00% CPY-3-O2 7.00% CY-3-O2 14.00% CY-3-O48.00% CY-5-O2 9.00% PYP-2-3 3.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 16

A liquid-crystalline mixture, preferably for PS-VA applications, of thecomposition

CC-3-V1 7.98% CCH-23 17.95% CCH-34 3.99% CCH-35 6.98% CCP-3-1 4.99%CCY-3-O2 12.46% CPY-2-O2 7.98% CPY-3-O2 10.97% CY-3-O2 15.45% RM-170.30% PY-3-O2 10.97%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Example 17

A liquid-crystalline mixture, preferably for VA applications, of thecomposition

CC-3-V 29.50% PP-1-3 11.00% PY-3-O2 12.00% CCP-3-1 9.50% CCOY-2-O218.00% CCOY-3-O2 13.00% GPP-5-2 7.00%is dispensed into a container using the filling device described in FIG.1 and FIG. 2.

Mixture Examples 1 to 17 may additionally also comprise one or more,preferably one or two, stabiliser(s) and/or a dopant from Tables C andD.

The liquid-crystal mixtures of Examples 18-168 shown below are dispensedinto a container analogously using the filling device described in FIG.1 and FIG. 2.

Example 18

CCY-3-O1 7.50% Clearing point [° C.]: 81.5 CCY-4-O2 3.50% Δn [589 nm,20° C.]: 0.1082 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −2.7 CPY-2-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.4 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.] 6.1PYP-2-3 9.00% γ₁ [mPa · s, 20° C.]: 88 CC-3-V 45.00% K₁ [pN, 20° C.]:13.4 PY-1-O4 4.00% K₃ [pN, 20° C.]: 15.3 PY-3-O2 2.00% V₀ [20° C., V]:2.53 Y-4O-O4 2.00%

Example 19

CCY-3-O1 7.50% Clearing point [° C.]: 81 CCY-4-O2 5.00% Δn [589 nm, 20°C.]: 0.1054 CLY-3-O2 7.00% Δε [1 kHz, 20° C.]: −2.6 CPY-2-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.4 CPY-3-O2 8.50% ε_(⊥) [1 kHz, 20° C.]: 6.0PYP-2-3 9.00% γ₁ [mPa · s, 20° C.]: 86 CC-3-V 45.50% K₁ [pN, 20° C.]:13.3 PY-1-O4 5.00% K₃ [pN, 20° C.]: 15.1 Y-4O-O4 2.50% V₀ [20° C., V]:2.54

Example 20

CC-3-2V1 4.00% Clearing point [° C.]: 100 CC-3-V 37.50% Δn [589 nm, 20°C.]: 0.1047 CC-3-V1 5.00% Δε [1 kHz, 20° C.]: 3.9 CCP-V-1 13.00% ε_(||)[1 kHz, 20° C.]: 6.6 CCP-V2-1 7.50% ε_(⊥) [1 kHz, 20° C.]: 2.7 CCVC-3-V6.00% γ₁ [mPa · s, 20° C.]: 72 CDUQU-3-F 1.00% K₁ [pN, 20° C.]: 15.1CPGP-5-2 3.00% K₃ [pN, 20° C.]: 17.4 DGUQU-4-F 2.00% V₀ [20° C., V]:2.07 PGP-2-3 5.00% PGP-2-4 3.00% PGUQU-3-F 4.00% PGUQU-4-F 3.50% PPGU-3F0.50% PUQU-3F 5.00%

Example 21

APUQU-2-F 1.50% Clearing point [° C.]: 100 APUQU-3-F 5.00% Δn [589 nm,20° C.]: 0.1056 CC-3-2V1 4.00% Δε [1 kHz, 20° C.]: 4.0 CC-3-V 36.00%ε_(||) [1 kHz, 20° C.]: 6.8 CC-3-V1 5.00% ε_(⊥) [1 kHz, 20° C.]: 2.8CCP-V-1 13.00% γ₁ [mPa · s, 20° C.]: 71 CCP-V2-1 9.50% K₁ [pN, 20° C.]:15.4 CCVC-3-V 4.00% K₃ [pN, 20° C.]: 17.7 CDUQU-3-F 3.00% V₀ [20° C.,V]: 2.07 DGUQU-4-F 2.00% PGP-1-2V 5.50% PGP-2-2V 7.00% PPGU-3-F 0.50%PUQU-3-F 4.00%

Example 22

CC-3-V1 9.00% Clearing point [° C.]: 74.7 CCH-23 18.00% Δn [589 nm, 20°C.]: 0.0982 CCH-34 3.00% Δε [1 kHz, 20° C.]: −3.4 CCH-35 7.00% ε_(||) [1kHz, 20° C.]: 3.5 CCP-3-1 5.50% ε_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O211.50% γ₁ [mPa · s, 20° C.]: 108 CPY-2-O2 8.00% K₁ [pN, 20° C.]: 14.9CPY-3-O2 11.00% K₃ [pN, 20° C.]: 15.9 CY-3-O2 15.50% V₀ [20° C., V]:2.28 PY-3-O2 11.50%

Example 22a

The mixture from Example 22 is additionally mixed with 0.001% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and 0.45% ofRM-1.

Example 23

CC-3-V 15.00% Clearing point [° C.]: 85 CPGP-4-3 2.00% Δn [589 nm, 20°C.]: 0.1981 CPGP-5-2 2.00% Δε [1 kHz, 20° C.]: 9.9 CPTP-301 6.00% ε_(||)[1 kHz, 20° C.]: 13.6 DGUQU-4-F 3.00% ε_(⊥) [1 kHz, 20° C.]: 3.7 PCH-3017.00% γ₁ [mPa · s, 20° C.]: 123 PGP-2-2V 14.50% K₁ [pN, 20° C.]: 15.1PGUQU-3-F 7.50% K₃ [pN, 20° C.]: 15.1 PGUQU-4-F 7.00% V₀ [20° C., V]:1.29 PGUQU-5-F 6.00% PP-1-2V1 12.00% PTP-102 6.00% PTP-201 6.00%PUQU-3-F 6.00%

Example 24

CC-3-V 28.00% Clearing point [° C.]: 84.8 CC-3-V1 3.00% Δn [589 nm, 20°C.]: 0.1078 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −4.1 CCY-3-O2 9.00% ε_(||)[1 kHz, 20° C.]: 3.7 CCY-4-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 7.8 CLY-3-O26.00% γ₁ [mPa · s, 20° C.]: 122 CLY-3-O3 6.00% K₁ [pN, 20° C.]: 14.8CPY-2-O2 7.00% CPY-3-O2 9.00% PY-3-O2 8.00% PY-4-O2 4.00% PYP-2-4 2.50%Y-4O-O4 5.50%

Example 24a

The mixture from Example 24 is additionally stabilised with

0.04% of

and0.01% of

Example 25

CC-3-V 28.00% Clearing point [° C.]: 80 CC-3-V1 5.00% Δn [589 nm, 20°C.]: 0.1082 CCP-3-1 2.50% Δε [1 kHz, 20° C.]: −4.1 CCY-3-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.8 CCY-4-O2 2.50% ε_(⊥) [1 kHz, 20° C.]: 7.9CLY-3-O2 6.50% γ₁ [mPa · s, 20° C.]: 113 CLY-3-O3 6.50% K₁ [pN, 20° C.]:14.5 CPY-2-O2 9.00% CPY-3-O2 10.00% PY-3-O2 10.00% PY-4-O2 5.00% Y-4O-O45.00%

Example 25a

The mixture from Example 25 is additionally stabilised with

0.04% of

and0.01% of

Example 26

CC-3-V 29.00% Clearing point [° C.]: 75.1 CC-3-V1 5.00% Δn [589 nm, 20°C.]: 0.1075 CCP-3-1 3.00% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.8 CLY-3-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.7CLY-3-O3 6.00% γ₁ [mPa · s, 20° C.]: 103 CPY-2-O2 9.00% K₁ [pN, 20° C.]:14.3 CPY-3-O2 10.00% PY-3-O2 10.00% PY-4-O2 7.00% Y-4O-O4 5.00%

Example 26a

The mixture from Example 26 is additionally stabilised with

0.04% of

and0.015% of

Example 27

CC-3-V 29.00% Clearing point [° C.]: 80.1 CCY-3-O1 8.00% Δn [589 nm, 20°C.]: 0.1052 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.7 CCY-4-O2 2.00%ε_(||) [1 kHz, 20° C.]: 3.9 CLY-3-O2 8.50% ε_(⊥) [1 kHz, 20° C.]: 8.7CLY-3-O3 7.50% γ₁ [mPa · s, 20° C.]: 125 CPY-2-O2 10.00% K₁ [pN, 20°C.]: 14.0 CPY-3-O2 7.50% CY-3-O2 6.50% PY-3-O2 10.00% Y-4O-O4 5.00%

Example 27a

The mixture from Example 27 is additionally stabilised with

0.04% of

and0.02% of

Example 28

CC-3-V 37.00% Clearing point [° C.]: 75.2 CCY-3-O1 5.00% Δn [589 nm, 20°C.]: 0.1012 CCY-3-O2 5.00% Δε [1 kHz, 20° C.]: −3.8 CCY-4-O2 4.00%ε_(||) [1 kHz, 20° C.]: 3.6 CLY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.5CPY-2-O2 9.00% γ₁ [mPa · s, 20° C.]: 97 CPY-3-O2 10.00% K₁ [pN, 20° C.]:13.3 CY-3-O2 12.00% K₃ [pN, 20° C.]: 15.3 PY-3-O2 11.00% V₀ [20° C., V]:2.12

Example 28a

The mixture from Example 28 is additionally stabilised with

0.04% of

and0.015% of

Example 29

CY-3-O2 15.00% Clearing point [° C.]: 80.4 CY-5-O2 12.50% Δn [589 nm,20° C.]: 0.1038 CCY-3-O1 2.50% Δε [1 kHz, 20° C.]: −3.3 CCY-4-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 137 CCY-2-1 6.00% K₁ [pN, 20° C.]:14.2 CCY-3-1 6.00% K₃ [pN, 20° C.]: 14.2 CCH-23 15.00% V₀ [20° C., V]:2.18 CCH-34 5.00% CCH-301 1.50% BCH-32 15.50%

Example 29a

The mixture from Example 29 is additionally stabilised with

0.01% of

Example 30

CY-3-O2 15.00% Clearing point [° C.]: 100 CY-3-O4 20.00% Δn [589 nm, 20°C.]: 0.0968 CY-5-O2 7.50% Δε [1 kHz, 20° C.]: −5.9 CCY-3-O2 6.50% ε_(||)[1 kHz, 20° C.]: 4.0 CCY-3-O3 6.50% ε_(⊥) [1 kHz, 20° C.]: 9.9 CCY-4-O26.50% γ₁ [mPa · s, 20° C.]: 324 CCY-5-O2 6.50% K₁ [pN, 20° C.]: 15.1CPY-2-O2 5.50% K₃ [pN, 20° C.]: 17.2 CPY-3-O2 5.00% V₀ [20° C., V]: 1.80CC-4-V 3.00% CH-33 3.00% CH-35 2.00% CH-43 3.00% CH-45 2.00% CCPC-334.00% CCPC-34 4.00%

Example 31

CY-3-O2 11.00% Clearing point [° C.]: 101 CY-3-O4 18.00% Δn [589 nm, 20°C.]: 0.1662 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −6.1 CCY-3-O3 6.00%ε_(||) [1 kHz, 20° C.]: 4.2 CCY-4-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 10.3CCY-5-O2 6.00% γ₁ [mPa · s, 20° C.]: 363 CPY-3-O2 6.00% K₁ [pN, 20° C.]:16.5 CC-4-V 3.00% K₃ [pN, 20° C.]: 22.00 CPTP-3-1 5.00% V₀ [20° C., V]:2.00 PTP-302FF 10.00% PTP-502FF 10.00% CPTP-302FF 5.00% CPTP-502FF 5.00%CCPC-33 3.00%

Example 32

CY-3-O2 8.00% Clearing point [° C.]: 101 CY-3-O4 13.00% Δn [589 nm, 20°C.]: 0.0970 CCY-3-O2 6.50% Δε [1 kHz, 20° C.]: −2.1 CPY-2-O2 3.50%ε_(||) [1 kHz, 20° C.]: 3.2 CPY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 5.3CCH-301 5.00% γ₁ [mPa · s, 20° C.]: 136 CC-4-V 12.00% K₁ [pN, 20° C.]:14.8 CC-5-V 8.00% K₃ [pN, 20° C.]: 18.3 CCP-V-1 13.00% V₀ [20° C., V]:3.11 CCP-V2-1 13.00% BCH-32 5.00% CCPC-33 5.00%

Example 33

CY-3-O4 12.00% Clearing point [° C.]: 101 CC-4-V 13.00% Δn [589 nm, 20°C.]: 0.1660 CC-5-V 9.50% Δε [1 kHz, 20° C.]: −2.1 CCP-V-1 10.50% ε_(||)[1 kHz, 20° C.]: 3.4 CCP-V2-1 10.00% ε_(⊥) [1 kHz, 20° C.]: 5.5 PTP-1023.00% γ₁ [mPa · s, 20° C.]: 151 CPTP-3-1 5.00% K₁ [pN, 20° C.]: 16.2CPTP-3-2 5.00% K₃ [pN, 20° C.]: 19.8 PTP-302FF 9.50% V₀ [20° C., V]:3.25 PTP-502FF 9.50% CPTP-302FF 6.50% CPTP-502FF 6.50%

Example 34

CY-3-O2 15.00% Clearing point [° C.]: 71.9 CCY-3-O1 6.00% Δn [589 nm,20° C.]: 0.1203 CCY-3-O2 8.00% Δϵ [1 kHz, 20° C.]: −8.1 CCY-3-O3 5.50%ϵ_(||) [1 kHz, 20° C.]: 5.2 CCY-4-O2 8.00% ϵ_(⊥) [1 kHz, 20° C.]: 13.3CCY-5-O2 8.00% γ₁ [mPa · s, 20° C.]: 253 CPY-2-O2 1.50% K₁ [pN, 20° C.]:13.2 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 15.7 CLY-3-O2 8.00% V₀ [20° C.,V]: 1.46 PY-3-O2 6.00% PY-1-O4 8.00% PY-4-O2 8.00% Y-4O-O4 8.00%

Example 35

CC-3-V1 8.00% Clearing point [° C.]: 75.5 CCH-23 18.00% Δn [589 nm, 20°C.]: 0.0978 CCH-34 4.00% Δϵ [1 kHz, 20° C.]: −3.5 CCH-35 7.00% ϵ_(||) [1kHz, 20° C.]: 3.5 CCP-3-1 5.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.9 CCY-3-O212.50% γ₁ [mPa · s, 20° C.]: 111 CPY-2-O2 8.00% K₁ [pN, 20° C.]: 14.9CPY-3-O2 11.00% K₃ [pN, 20° C.]: 15.8 CY-3-O2 15.50% V₀ [20° C., V]:2.26 PY-3-O2 11.00%

Example 35a

The mixture from Example 35 is additionally mixed with 0.3% of RM-1

Example 36

BCH-32 1.50% Clearing point [° C.]: 74.8 CC-3-V 15.50% Δn [589 nm, 20°C.]: 0.1035 CC-3-V1 11.00% Δϵ [1 kHz, 20° C.]: −3.1 CCH-23 12.00% ϵ_(||)[1 kHz, 20° C.]: 3.4 CCH-34 3.50% ϵ_(⊥) [1 kHz, 20° C.]: 6.5 CCY-3-O211.50% γ₁ [mPa · s, 20° C.]: 95 CCY-5-O2 0.50% K₁ [pN, 20° C.]: 14.1CPY-2-O2 8.50% K₃ [pN, 20° C.]: 15.4 CPY-3-O2 12.00% V₀ [20° C., V]:2.36 CY-3-O2 9.50% PY-3-O2 11.50% PYP-2-3 3.00%

Example 36a

The mixture from Example 36 is additionally mixed with 0.001% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and 0.3% of RM-1.

Example 37

CC-3-V 30.50% Clearing point [° C.]: 79.8 CC-3-V1 4.50% Δn [589 nm, 20°C.]: 0.1022 CCY-3-O1 5.00% Δϵ [1 kHz, 20° C.]: −4.0 CCY-3-O2 6.00%ϵ_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O3 4.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.6CLY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 114 CPY-2-O2 8.00% K₁ [pN, 20° C.]:14.5 CPY-3-O2 11.00% K₃ [pN, 20° C.]: 16.7 CY-3-O2 15.00% V₀ [20° C.,V]: 2.14 PY-3-O2 8.00%

Example 38

CY-3-O2 15.00% Clearing point [° C.]: 80.4 CY-5-O2 12.50% Δn [589 nm,20° C.]: 0.1038 CCY-3-O1 2.50% Δϵ [1 kHz, 20° C.]: −3.3 CCY-4-O2 5.00%ϵ_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 8.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 137 CCY-2-1 6.00% K₁ [pN, 20° C.]:14.2 CCY-3-1 6.00% K₃ [pN, 20° C.]: 14.2 CCH-23 15.00% V₀ [20° C., V]:2.18 CCH-34 5.00% CCH-301 1.50% BCH-32 15.50%

Example 39

CY-3-O2 15.00% Clearing point [° C.]: 80.5 CY-3-O4 4.00% Δn [589 nm, 20°C.]: 0.1025 CY-5-O2 6.50% Δϵ [1 kHz, 20° C.]: −3.4 CCY-3-O1 5.00% ϵ_(||)[1 kHz, 20° C.]: 3.5 CCY-3-O3 2.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.9 CCY-4-O26.00% γ₁ [mPa · s, 20° C.]: 141 CPY-2-O2 7.00% K₁ [pN, 20° C.]: 14.0CPY-3-O2 7.00% K₃ [pN, 20° C.]: 14.1 CCY-2-1 6.00% V₀ [20° C., V]: 2.16CCY-3-1 6.00% CCH-23 15.50% CCH-34 5.00% BCH-32 13.00% PP-1-4 2.00%

Example 40

PGUQU-3-F 4.00% Clearing point [° C.]: 85.4 CCQU-3-F 7.50% Δn [589 nm,20° C.]: 0.1028 PUQU-3-F 15.50% Δϵ [1 kHz, 20° C.]: 9.9 APUQU-2-F 4.00%ϵ_(||) [1 kHz, 20° C.]: 13.3 APUQU-3-F 7.50% ϵ_(⊥) [1 kHz, 20° C.]: 3.4CC-3-V 27.50% γ₁ [mPa · s, 20° C.]: 82 CCP-3-V1 6.00% K₁ [pN, 20° C.]:12.6 CCP-V-1 13.00% K₃ [pN, 20° C.]: 15.3 CCP-V2-1 10.00% V₀ [20° C.,V]: 1.19 PPGU-3-F 0.50% BCH-3F.F 4.50%

Example 40a

The mixture from Example 40 is additionally stabilised with

0.01% of

Example 41

CC-3-V 30.50% Clearing point [° C.]: 80.1 CC-3-V1 4.50% Δn [589 nm, 20°C.]: 0.1033 CCY-3-O1 6.00% Δϵ [1 kHz, 20° C.]: −4.0 CCY-3-O2 8.00%ϵ_(||) [1 kHz, 20° C.]: 3.6 CLY-3-O2 8.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.6CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 113 CPY-3-O2 12.00% K₁ [pN, 20°C.]: 14.4 CY-3-O2 15.00% K₃ [pN, 20° C.]: 17.0 PY-3-O2 8.00% V₀ [20° C.,V]: 2.16

Example 41a

The mixture from Example 41 is additionally stabilised with

0.3% of

Example 42

CC-3-V 28.50% Clearing point [° C.]: 74.6 CC-3-V1 7.00% Δn [589 nm, 20°C.]: 0.1040 CCY-3-O2 12.50% Δϵ [1 kHz, 20° C.]: −3.0 CCY-4-O2 5.25%ϵ_(||) [1 kHz, 20° C.]: 3.5 CPY-3-O2 9.75% ϵ_(⊥) [1 kHz, 20° C.]: 6.5CY-3-O2 15.00% γ₁ [mPa · s, 20° C.]: 98 CY-3-O4 4.75% K₁ [pN, 20° C.]:13.2 CY-5-O2 1.00% K₃ [pN, 20° C.]: 15.5 PCH-301 3.25% V₀ [20° C., V]:2.4 PPGU-3-F 0.50% PYP-2-3 12.50%

Example 42a

The mixture from Example 42 is additionally mixed with 0.001% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and 0.45% ofRM-1.

Example 43

CC-3-V 36.50% Clearing point [° C.]: 75 CC-3-V1 2.00% Δn [589 nm, 20°C.]: 0.1015 CCY-3-O1 8.00% Δϵ [1 kHz, 20° C.]: −3.7 CCY-3-O2 6.00%ϵ_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 2.50% ϵ_(⊥) [1 kHz, 20° C.]: 7.3CLY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 97 CLY-3-O3 2.00% K₁ [pN, 20° C.]:13.8 CPY-2-O2 10.00% K₃ [pN, 20° C.]: 15 CPY-3-O2 3.00% V₀ [20° C., V]:2.14 CY-3-O2 5.50% PY-3-O2 13.00% PY-1-O4 3.50%

Example 44

BCH-32 4.50% Clearing point [° C.]: 75.5 CCH-23 14.00% Δn [589 nm, 20°C.]: 0.0938 CCH-301 7.00% Δϵ [1 kHz, 20° C.]: −2.5 CCH-34 9.00% ϵ_(||)[1 kHz, 20° C.]: 3.3 CCH-35 5.50% ϵ_(⊥) [1 kHz, 20° C.]: 5.8 CCP-3-110.00% γ₁ [mPa · s, 20° C.]: 89 CY-3-O2 5.00% K₁ [pN, 20° C.]: 13.5CY-V-O2 7.00% K₃ [pN, 20° C.]: 14.5 CCY-3-O1 5.00% V₀ [20° C., V]: 2.54CCY-3-O2 9.00% CPY-V-O2 10.00% PCH-302 5.00% PY-V2-O2 9.00%

Example 45

BCH-32 1.50% Clearing point [° C.]: 75 CC-3-V 37.00% Δn [589 nm, 20°C.]: 0.0960 CCP-3-1 8.00% Δϵ [1 kHz, 20° C.]: −2.6 CY-3-O2 15.00% ϵ_(||)[1 kHz, 20° C.]: 3.4 CCY-3-O1 7.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.0 CCY-3-O29.50% γ₁ [mPa · s, 20° C.]: 79 CPY-3-O2 8.50% K₁ [pN, 20° C.]: 13.0PCH-302 5.50% K₃ [pN, 20° C.]: 16.0 PY-V-O2 8.00% V₀ [20° C., V]: 2.6

Example 46

BCH-32 1.00% Clearing point [° C.]: 75 CC-3-V 41.00% Δn [589 nm, 20°C.]: 0.0948 CCP-3-1 8.50% Δϵ [1 kHz, 20° C.]: −2.3 CY-3-O2 13.00% ϵ_(||)[1 kHz, 20° C.]: 3.2 CCY-3-O1 6.50% ϵ_(⊥) [1 kHz, 20° C.]: 5.5 CCY-3-O28.50% γ₁ [mPa · s, 20° C.]: 70 CPY-3-O2 6.00% K₁ [pN, 20° C.]: 13.4PCH-302 7.00% K₃ [pN, 20° C.]: 16.5 PY-1V-O2 8.50% V₀ [20° C., V]: 2.84

Example 47

PY-3-O2 7.50% Clearing point [° C.]: 74 PY-1V-O2 4.00% Δn [589 nm, 20°C.]: 0.1094 CY-3-O2 14.50% Δϵ [1 kHz, 20° C.]: −3.0 CCY-3-O1 3.00%ϵ_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 9.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.6CPY-2-O2 7.50% γ₁ [mPa · s, 20° C.]: 85 CPY-3-O2 9.00% K₁ [pN, 20° C.]:12.9 CC-3-V 37.00% K₃ [pN, 20° C.]: 14.6 BCH-32 8.00% V₀ [20° C., V]:2.34 PPGU-3-F 0.50%

Example 48

PY-3-O2 8.00% Clearing point [° C.]: 74.5 PY-3V-O2 5.00% Δn [589 nm, 20°C.]: 0.1086 CY-3-O2 11.50% Δϵ [1 kHz, 20° C.]: −3.0 CCY-3-O1 10.00%ϵ_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 4.00% ϵ_(⊥) [1 kHz, 20° C.]: 6.6CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 87 CPY-3-O2 7.00% K₁ [pN, 20° C.]:12.9 CC-3-V 37.50% K₃ [pN, 20° C.]: 14.1 BCH-32 6.50% V₀ [20° C., V]:2.30 PPGU-3-F 0.50%

Example 49

PY-V2-O2 12.00% Clearing point [° C.]: 76 CY-V-O2 9.00% Δn [589 nm, 20°C.]: 0.1087 CCY-3-O1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCY-V2-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.9CPY-V-O2 10.50% γ₁ [mPa · s, 20° C.]: 83 CC-3-V 36.50% K₁ [pN, 20° C.]:12.4 BCH-32 6.50% K₃ [pN, 20° C.]: 14.7 PPGU-3-F 0.50% V₀ [20° C., V]:2.28

Example 50

PY-V2-O2 11.50% Clearing point [° C.]: 75.5 CY-3-O2 11.00% Δn [589 nm,20° C.]: 0.1074 CCY-3-O1 9.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 4.00%ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 12.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 87 CC-3-V 37.00% K₁ [pN, 20° C.]:13.0 BCH-32 6.00% K₃ [pN, 20° C.]: 14.7 PPGU-3-F 0.50% V₀ [20° C., V]:2.29

Example 51

PY-1V-O2 10.50% Clearing point [° C.]: 72 CY-3-O2 18.00% Δn [589 nm, 20°C.]: 0.1068 CCY-3-O1 7.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 78 CC-3-V 41.00% K₁ [pN, 20° C.]:12.6 BCH-32 3.00% K₃ [pN, 20° C.]: 14.6 PPGU-3-F 0.50% V₀ [20° C., V]:2.30

Example 52

PY-V2-O2 10.50% Clearing point [° C.]: 75 CY-3-O2 10.00% Δn [589 nm, 20°C.]: 0.1070 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 9.00%ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.0CPY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 90 CC-3-V 35.00% K₁ [pN, 20° C.]:12.7 BCH-32 6.50% K₃ [pN, 20° C.]: 14.5 PPGU-3-F 0.50% V₀ [20° C., V]:2.23 Y-4O-O4 2.50% LTS (bulk) [−20° C.]: >1000 h LTS (bulk) [−30°C.]: >1000 h

Example 53

PY-1V-O2 10.00% Clearing point [° C.]: 73.5 CY-3-O2 18.00% Δn [589 nm,20° C.]: 0.1084 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 82 CC-3-V 40.00% K₁ [pN, 20° C.]:12.8 BCH-32 3.50% K₃ [pN, 20° C.]: 14.9 PPGU-3-F 0.50% V₀ [20° C., V]:2.3

Example 54

PY-V2-O2 11.50% Clearing point [° C.]: 74.5 CY-3-O2 10.00% Δn [589 nm,20° C.]: 0.1071 CCY-3-O1 4.50% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 11.00%ε_(||) [1 kHz, 20° C.]: 3.8 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.1CPY-3-O2 12.50% γ₁ [mPa · s, 20° C.]: 91 CC-3-V 34.50% K₁ [pN, 20° C.]:12.7 BCH-32 6.00% K₃ [pN, 20° C.]: 14.6 PPGU-3-F 0.50% V₀ [20° C., V]:2.2 Y-4O-O4 2.50%

Example 55

PY-V2-O2 14.00% Clearing point [° C.]: 74.5 CY-3-O2 10.50% Δn [589 nm,20° C.]: 0.1075 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 90 CC-3-V 36.50% K₁ [pN, 20° C.]:11.7 BCH-32 2.50% K₃ [pN, 20° C.]: 14.1 PPGU-3-F 0.50% V₀ [20° C., V]:2.21

Example 56

PY-3V-O2 10.50% Clearing point [° C.]: 74.5 CY-3-O2 15.00% Δn [589 nm,20° C.]: 0.1073 CCY-3-O1 7.50% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 4.00%ε_(||) [1 kHz, 20° C.]: 3.6 CPY-2-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 6.6CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 84 CC-3-V 40.50% K₁ [pN, 20° C.]:12.8 BCH-32 3.00% K₃ [pN, 20° C.]: 14.1 PPGU-3-F 0.50% V₀ [20° C., V]:2.29

Example 57

CC-3-V 36.50% Clearing point [° C.]: 73 CY-3-O2 10.00% Δn [589 nm, 20°C.]: 0.1081 CCY-3-O1 6.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 11.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-4-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 8.50% γ₁ [mPa · s, 20° C.]: 90 PY-3-O2 4.00% K₁ [pN, 20° C.]:13.2 PY-3V-O2 6.50% K₃ [pN, 20° C.]: 15.0 PY-1-O4 4.50% V₀ [20° C., V]:2.25 PYP-2-3 3.00% PP-1-2V1 3.50%

Example 58

PY-V2-O2 7.00% Clearing point [° C.]: 75.5 CY-3-O2 10.00% Δn [589 nm,20° C.]: 0.1086 CY-1V2-O2 6.00% Δε [1 kHz, 20° C.]: −2.7 CCY-3-O1 5.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-3-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.2CPY-2-O2 12.00% γ₁ [mPa · s, 20° C.]: 85 CPY-3-O2 10.00% K₁ [pN, 20°C.]: 12.8 CC-3-V 37.00% K₃ [pN, 20° C.]: 14.5 BCH-32 10.50% V₀ [20° C.,V]: 2.45 PPGU-3-F 0.50% LTS (bulk) [−20° C.]: >1000 h

Example 59

PY-V-O2 5.00% Clearing point [° C.]: 75 PY-V2-O2 5.00% Δn [589 nm, 20°C.]: 0.1087 PY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.1 CY-V-O2 4.00% ε_(||)[1 kHz, 20° C.]: 3.7 CY-3-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 CCY-3-O13.50% γ₁ [mPa · s, 20° C.]: 83 CCY-3-O2 7.00% K₁ [pN, 20° C.]: 12.6CCY-4-O2 5.00% K₃ [pN, 20° C.]: 14.2 CPY-2-O2 8.00% V₀ [20° C., V]: 2.28CPY-3-O2 10.00% LTS (bulk) [−20° C.]: >1000 h CC-3-V 38.00% BCH-32 6.00%PPGU-3-F 0.50% Y-4O-O4 2.00%

Example 60

PY-V2-O2 5.50% Clearing point [° C.]: 75.5 PY-3-O2 8.00% Δn [589 nm, 20°C.]: 0.1075 CY-V-O2 6.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 5.50% ε_(||)[1 kHz, 20° C.]: 3.7 CCY-3-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 CCY-4-O24.00% γ₁ [mPa · s, 20° C.]: 88 CPY-2-O2 8.00% K₁ [pN, 20° C.]: 12.6CPY-3-O2 9.00% K₃ [pN, 20° C.]: 14.0 CC-3-V 35.00% V₀ [20° C., V]: 2.26BCH-32 8.00% LTS (bulk) [−20° C.]: >1000 h PPGU-3-F 0.50% LTS (bulk)[−30° C.]: >1000 h Y-4O-O4 2.00%

Example 61

PY-V-O2 5.50% Clearing point [° C.]: 74.5 PY-3-O2 4.50% Δn [589 nm, 20°C.]: 0.1098 CY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 10.50%ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CPY-3-O2 11.00% γ₁ [mPa · s, 20° C.]: 85 CC-3-V 37.00% K₁ [pN, 20° C.]:12.9 BCH-32 8.00% K₃ [pN, 20° C.]: 14.5 PPGU-3-F 0.50% V₀ [20° C., V]:2.31 Y-4O-O4 2.00% LTS (bulk) [−20° C.]: >1000 h LTS (bulk) [−30°C.]: >1000 h

Example 62

PY-3-O2 6.00% Clearing point [° C.]: 75 PY-V2-O2 6.00% Δn [589 nm, 20°C.]: 0.1079 CY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 4.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 9.50% ε_(⊥) [1 kHz, 20° C.]: 6.9CPY-2-O2 9.50% γ₁ [mPa · s, 20° C.]: 91 CPY-3-O2 10.00% K₁ [pN, 20° C.]:13.1 CC-3-V 35.50% K₃ [pN, 20° C.]: 14.9 BCH-32 7.00% V₀ [20° C., V]:2.29 PPGU-3-F 0.50% LTS (bulk) [−20° C.]: >1000 h LTS (bulk) [−30°C.]: >1000 h

Example 63

PY-3-O2 6.00% Clearing point [° C.]: 75 PY-1V2-O2 6.50% Δn [589 nm, 20°C.]: 0.1088 CY-3-O2 13.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 12.00%ε_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.9CPY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 93 CC-3-V 36.00% K₁ [pN, 20° C.]:13.5 BCH-32 6.00% K₃ [pN, 20° C.]: 15.6 PPGU-3-F 0.50% V₀ [20° C., V]:2.32

Example 64

PY-3-O2 4.50% Clearing point [° C.]: 75 PY-V2-O2 6.00% Δn [589 nm, 20°C.]: 0.1078 CY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 2.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 11.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 88 CPY-3-O2 12.00% K₁ [pN, 20° C.]:13.0 CC-3-V 36.00% K₃ [pN, 20° C.]: 14.8 BCH-32 8.00% V₀ [20° C., V]:2.31 PPGU-3-F 0.50% LTS (bulk) [−30° C.] >1000 h Y-4O-O4 2.00%

Example 64a

The mixture from Example 64 is additionally stabilised with

0.01% of

Example 65

BCH-32 6.00% Clearing point [° C.]: 77 CCH-23 16.00% Δn [589 nm, 20°C.]: 0.0953 CCH-301 3.50% Δε [1 kHz, 20° C.]: −2.5 CCH-34 6.00% ε_(||)[1 kHz, 20° C.]: 3.3 CCH-35 6.00% ε_(⊥) [1 kHz, 20° C.]: 5.8 CCP-3-112.00% γ₁ [mPa · s, 20° C.]: 96 CY-3-O2 15.00% K₁ [pN, 20° C.]: 14.6CCY-3-O1 5.00% K₃ [pN, 20° C.]: 15.6 CCY-3-O2 7.00% V₀ [20° C., V]: 2.66CPY-3-O2 8.50% LTS (bulk) [−20° C.] >1000 h PCH-302 6.00% LTS (bulk)[−30° C.] >1000 h PY-V2-O2 9.00%

Example 66

BCH-32 4.00% Clearing point [° C.]: 76 CC-3-V 34.50% Δn [589 nm, 20°C.]: 0.0955 CCP-3-1 10.00% Δε [1 kHz, 20° C.]: −2.5 CY-3-O2 14.00%ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 5.9CCY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 82 CPY-3-O2 9.00% K₁ [pN, 20° C.]:13.4 PCH-302 4.50% K₃ [pN, 20° C.]: 16.2 PY-V2-O2 9.00% V₀ [20° C., V]:2.66 LTS (bulk) [−20° C.]: >1000 h LTS (bulk) [−30° C.]: >1000 h

Example 67

BCH-32 6.50% Clearing point [° C.]: 76.5 CCH-23 16.00% Δn [589 nm, 20°C.]: 0.0933 CCH-301 4.50% Δε [1 kHz, 20° C.]: −2.5 CCH-34 8.00% ε_(||)[1 kHz, 20° C.]: 3.3 CCH-35 6.00% ε_(⊥) [1 kHz, 20° C.]: 5.8 CCP-3-18.50% γ₁ [mPa · s, 20° C.]: 96 CY-3-O2 15.00% K₁ [pN, 20° C.]: 14.3CCY-3-O1 5.50% K₃ [pN, 20° C.]: 15.0 CCY-3-O2 8.00% V₀ [20° C., V]: 2.57CPY-3-O2 9.00% PCH-302 4.50% PY-V2-O2 8.50%

Example 68

Y-4O-O4 7.00% Clearing point [° C.]: 75.5 PY-1-O4 2.00% Δn [589 nm, 20°C.]: 0.1062 CCY-3-O1 2.50% Δε [1 kHz, 20° C.]: −2.2 CCY-3-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.4 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 5.5PYP-2-3 8.50% γ₁ [mPa · s, 20° C.]: 90 CCH-23 19.00% K₁ [pN, 20° C.]:14.5 CCH-34 6.00% K₃ [pN, 20° C.]: 14.2 CCH-35 6.00% V₀ [20° C., V]:2.70 PCH-302 8.00% BCH-32 7.00% CCP-3-1 10.00% PY-V2-O2 6.00%

Example 69

BCH-32 7.00% Clearing point [° C.]: 75 CCH-23 16.00% Δn [589 nm, 20°C.]: 0.0930 CCH-301 3.50% Δε [1 kHz, 20° C.]: −2.5 CCH-34 6.50% ε_(||)[1 kHz, 20° C.]: 3.3 CCH-35 6.50% ε_(⊥) [1 kHz, 20° C.]: 5.8 CCP-3-19.50% γ₁ [mPa · s, 20° C.]: 93 CY-3-O2 7.50% K₁ [pN, 20° C.]: 13.7CY-V1-O2 7.00% K₃ [pN, 20° C.]: 14.1 CCY-3-O1 6.00% V₀ [20° C., V]: 2.52CCY-3-O2 9.00% LTS (bulk) [−20° C.] >1000 h CPY-3-O2 7.00% PCH-302 5.00%PY-V2-O2 9.50%

Example 70

BCH-32 7.00% Clearing point [° C.]: 74 CCH-23 15.00% Δn [589 nm, 20°C.]: 0.0921 CCH-301 4.00% Δε [1 kHz, 20° C.]: −2.5 CCH-34 8.00% ε_(||)[1 kHz, 20° C.]: 3.4 CCH-35 7.00% ε_(⊥) [1 kHz, 20° C.]: 5.9 CCP-3-18.00% γ₁ [mPa · s, 20° C.]: 95 CY-3-O2 9.00% K₁ [pN, 20° C.]: 13.4CY-V1-O2 7.00% K₃ [pN, 20° C.]: 14.1 CCY-3-O1 9.00% V₀ [20° C., V]: 2.49CCY-3-O2 7.00% CPY-1V-O1 7.00% PCH-302 4.00% PY-V2-O2 8.00%

Example 71

BCH-32 7.00% Clearing point [° C.]: 77 CCH-23 13.00% Δn [589 nm, 20°C.]: 0.0935 CCH-301 3.00% Δε [1 kHz, 20° C.]: −2.4 CCH-34 10.00% ε_(||)[1 kHz, 20° C.]: 3.3 CCH-35 6.00% ε_(⊥) [1 kHz, 20° C.]: 5.7 CCP-3-110.50% γ₁ [mPa · s, 20° C.]: 97 CY-3-O2 8.50% K₁ [pN, 20° C.]: 14.1CY-V1-O2 5.50% K₃ [pN, 20° C.]: 14.6 CCY-3-O1 10.00% V₀ [20° C., V]:2.62 CCY-3-O2 6.00% CPY-1V-O1 5.50% PCH-302 6.00% PY-V2-O2 9.00%

Example 72

CY-3-O2 9.50% Clearing point [° C.]: 75 PY-V-O2 9.50% Δn [589 nm, 20°C.]: 0.1101 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.0 CCY-4-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.5CPY-3-O2 9.50% γ₁ [mPa · s, 20° C.]: 100 CCH-34 10.00% K₁ [pN, 20° C.]:13.4 CCH-23 21.00% K₃ [pN, 20° C.]: 14.3 PYP-2-3 7.00% V₀ [20° C., V]:2.31 CCP-3-1 3.00% PCH-301 10.50%

Example 73

PY-3-O2 11.00% Clearing point [° C.]: 75 PY-1V-O2 8.00% Δn [589 nm, 20°C.]: 0.1100 CY-3-O2 5.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 9.00% ε_(||)[1 kHz, 20° C.]: 3.5 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.9 CPY-2-O27.00% γ₁ [mP · s, 20° C.]: 107 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3CCH-34 10.00% K₃ [pN, 20° C.]: 15.2 CCH-23 21.00% V₀ [20° C., V]: 2.24CCP-3-1 4.00% PCH-301 9.00%

Example 74

CY-3-O2 10.00% Clearing point [° C.]: 75 PY-V-O2 9.00% Δn [589 nm, 20°C.]: 0.1099 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.2 CCY-4-O2 7.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CPY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 104 CCH-34 11.00% K₁ [pN, 20° C.]:13.2 CCH-23 20.00% K₃ [pN, 20° C.]: 14.1 PYP-2-3 7.00% V₀ [20° C., V]:2.24 CCP-3-1 1.00% PCH-301 10.00%

Example 75

CY-3-O2 12.50% Clearing point [° C.]: 74 PY-3-O2 4.00% Δn [589 nm, 20°C.]: 0.1026 PY-V-O2 5.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O2 9.00% ε_(||)[1 kHz, 20° C.]: 3.5 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.7 CCY-4-O22.00% γ₁ [mPa · s, 20° C.]: 102 CPY-2-O2 7.00% K₁ [pN, 20° C.]: 13.5CPY-3-O2 9.00% K₃ [pN, 20° C.]: 14.1 CCH-34 10.00% V₀ [20° C., V]: 2.22CCH-23 21.00% LTS (bulk) [−20° C.]: >1000 h BCH-32 5.50% PCH-301 8.00%PYP-2-3 1.00%

Example 76

PY-3-O2 12.00% Clearing point [° C.]: 75 PY-V-O2 5.00% Δn [589 nm, 20°C.]: 0.1112 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 9.50%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.6CPY-3-O2 9.00% γ₁ [mPa · s, 20° C.]: 107 CCH-34 5.50% K₁ [pN, 20° C.]:13.7 CCH-23 21.00% K₃ [pN, 20° C.]: 14.4 PYP-2-3 4.50% V₀ [20° C., V]:2.29 CCH-35 4.00% PCH-301 12.00% BCH-32 1.50%

Example 77

PY-V-O2 8.00% Clearing point [° C.]: 74.8 CY-3-O2 5.50% Δn [589 nm, 20°C.]: 0.1073 CY-V-O2 11.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O1 4.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 82 CPY-V-O4 7.00% K₁ [pN, 20° C.]:12.1 CC-3-V 37.00% K₃ [pN, 20° C.]: 14.6 BCH-32 7.00% V₀ [20° C., V]:2.30 PPGU-3-F 0.50%

Example 78

PY-3-O2 5.00% Clearing point [° C.]: 76 PY-V2-O2 6.50% Δn [589 nm, 20°C.]: 0.1082 CY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.2 CCY-3-O1 5.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 6.9CPY-V-O2 9.00% γ₁ [mPa · s, 20° C.]: 89 CPY-V-O4 10.00% K₁ [pN, 20° C.]:12.6 CC-3-V 35.00% K₃ [pN, 20° C.]: 14.6 BCH-32 7.00% V₀ [20° C., V]:2.26 PPGU-3-F 0.50%

Example 78a

The mixture from Example 78 is additionally stabilised with

0.01% of

Example 78b

The mixture from Example 78 is additionally stabilised with

0.01% of

Example 79

PY-V-O2 5.00% Clearing point [° C.]: 73.5 PY-V2-O2 5.00% Δn [589 nm, 20°C.]: 0.1074 PY-3-O2 3.00% Δε [1 kHz, 20° C.]: −2.9 CY-V-O2 4.00% ε_(||)[1 kHz, 20° C.]: 3.7 CY-3-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCY-3-O13.00% γ₁ [mPa · s, 20° C.]: 78 CCY-3-O2 6.00% K₁ [pN, 20° C.]: 12.5CCY-4-O2 5.00% K₃ [pN, 20° C.]: 14.0 CPY-2-O2 7.50% V₀ [20° C., V]: 2.33CPY-3-O2 10.00% CC-3-V 39.00% BCH-32 7.00% PPGU-3-F 0.50% Y-4O-O4 2.00%

Example 80

PY-V-O2 5.00% Clearing point [° C.]: 75 CY-3-O2 8.00% Δn [589 nm, 20°C.]: 0.1078 CY-V-O2 11.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O1 4.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 84 CPY-V-O4 5.00% K₁ [pN, 20° C.]:11.9 CPY-V-O2 7.00% K₃ [pN, 20° C.]: 14.4 CC-3-V 35.50% V₀ [20° C., V]:2.30 BCH-32 9.00% PPGU-3-F 0.50%

Example 81

APUQU-2-F 9.00% Clearing point [° C.]: 77.5 APUQU-3-F 8.50% Δn [589 nm,20° C.]: 0.1087 CC-3-V 43.50% Δε [1 kHz, 20° C.]: 9.9 CCP-30CF₃ 7.50%ε_(||) [1 kHz, 20° C.]: 13.7 CCP-V-1 7.00% ε_(⊥) [1 kHz, 20° C.]: 3.8DPGU-4-F 3.50% γ₁ [mPa · s, 20° C.]: 68 PGP-2-2V 4.00% K₁ [pN, 20° C.]:12.4 PGUQU-4-F 4.50% K₃ [pN, 20° C.]: 13.1 PUQU-3-F 8.50% V₀ [20° C.,V]: 1.18 PY-3V-O2 4.00% LTS (bulk) [−20° C.]: >1000 h LTS (bulk) [−30°C.]: >1000 h

Example 82

PY-1V-O2 4.50% Clearing point [° C.]: 73.5 PY-V2-O2 5.00% Δn [589 nm,20° C.]: 0.1074 CY-3-O2 10.00% Δε [1 kHz, 20° C.]: −2.8 CY-V-O2 4.50%ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CCY-3-O2 3.00% γ₁ [mPa · s, 20° C.]: 78 CPY-2-O2 9.00% K₁ [pN, 20° C.]:12.5 CPY-3-O2 10.00% K₃ [pN, 20° C.]: 14.3 CC-3-V 39.50% V₀ [20° C., V]:2.40 BCH-32 8.00% PPGU-3-F 0.50%

Example 83

PY-V2-O2 5.50% Clearing point [° C.]: 74 PY-3-O2 6.00% Δn [589 nm, 20°C.]: 0.1074 CY-V2-O2 5.00% Δε [1 kHz, 20° C.]: −2.9 CY-3-O2 4.00% ε_(||)[1 kHz, 20° C.]: 3.7 CCY-3-O1 3.00% ε_(⊥) [1 kHz, 20° C.]: 6.6 CCY-3-O23.00% γ₁ [mPa · s, 20° C.]: 85 CCY-4-O2 6.00% K₁ [pN, 20° C.]: 12.6CPY-2-O2 8.00% K₃ [pN, 20° C.]: 13.9 CPY-3-O2 12.00% V₀ [20° C., V]:2.30 CC-3-V 36.50% BCH-32 8.50% PPGU-3-F 0.50% Y-4O-O4 2.00%

Example 84

PY-V2-O2 6.00% Clearing point [° C.]: 74.5 PY-3-O2 6.00% Δn [589 nm, 20°C.]: 0.1086 CY-1V2-O2 4.50% Δε [1 kHz, 20° C.]: −2.9 CY-3-O2 4.00%ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O1 3.00% ε_(⊥) [1 kHz, 20° C.]: 6.5CCY-3-O2 3.00% γ₁ [mPa · s, 20° C.]: 86 CCY-4-O2 6.00% K₁ [pN, 20° C.]:12.8 CPY-2-O2 8.00% K₃ [pN, 20° C.]: 14.2 CPY-3-O2 12.00% V₀ [20° C.,V]: 2.33 CC-3-V 37.00% BCH-32 8.00% PPGU-3-F 0.50% Y-4O-O4 2.00%

Example 85

PY-V2-O2 6.50% Clearing point [° C.]: 74 CY-3-O2 11.00% Δn [589 nm, 20°C.]: 0.1068 CY-V2-O2 6.50% Δε [1 kHz, 20° C.]: −2.8 CCY-3-O1 6.00%ε_(||) [1 kHz, 20° C.]: 3.6 CCY-3-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 85 CPY-3-O2 12.00% K₁ [pN, 20°C.]: 12.3 CC-3-V 36.00% K₃ [pN, 20° C.]: 14.1 BCH-32 9.50% V₀ [20° C.,V]: 2.35 PPGU-3-F 0.50%

Example 86

PCH-504FF 10.00% Clearing point [° C.]: 72 PCH-502FF 8.00% Δn [589 nm,20° C.]: 0.1216 PCH-304FF 4.00% Δε [1 kHz, 20° C.]: −4.0 CCP-V2-1 6.00%ε_(||) [1 kHz, 20° C.]: 3.9 BCH-32 7.00% ε_(⊥) [1 kHz, 20° C.]: 7.9CCH-35 5.00% γ₁ [mPa · s, 20° C.]: 125 CC-5-V 7.00% K₁ [pN, 20° C.]:14.6 CC-3-V1 10.00% K₃ [pN, 20° C.]: 14.7 CPY-2-O2 10.00% V₀ [20° C.,V]: 2.03 CPY-3-O2 13.00% PY-V2-O2 20.00%

Example 87

CY-3-O2 24.00% Clearing point [° C.]: 81 PY-1V2-O2 7.00% Δn [589 nm, 20°C.]: 0.1019 CCY-3-O3 4.00% Δε [1 kHz, 20° C.]: −3.1 CCY-3-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.6CPY-3-O2 5.00% γ₁ [mPa · s, 20° C.]: 126 CCP-3-3 9.00% K₁ [pN, 20° C.]:14.9 CCP-3-1 9.00% K₃ [pN, 20° C.]: 16.0 BCH-32 5.00% V₀ [20° C., V]:2.39 CCH-34 10.00% LTS (bulk) [−20° C.]: >1000 h CCH-25 10.00% PCH-3015.00%

Example 88

CY-3-O2 18.00% Clearing point [° C.]: 80.5 PY-1V2-O2 6.00% Δn [589 nm,20° C.]: 0.0949 CCY-3-O2 8.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 4.00%ε_(||) [1 kHz, 20° C.]: 3.4 CPY-2-O2 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 113 CCH-34 8.00% K₁ [pN, 20° C.]:14.9 CCH-23 22.00% K₃ [pN, 20° C.]: 16.0 CCP-3-3 7.00% V₀ [20° C., V]:2.41 CCP-3-1 7.00% LTS (bulk) [−20° C.]: >1000 h PCH-301 3.00%

Example 89

CY-1V-O1V 20.00% Clearing point [° C.]: 82.5 PY-1V2-O2 7.00% Δn [589 nm,20° C.]: 0.0987 CY-3-O2 5.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.4 CCY-4-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 109 CCH-34 10.00% K₁ [pN, 20° C.]:14.9 CC-3-V1 11.00% K₃ [pN, 20° C.]: 18.9 CC-2-V1 11.00% V₀ [20° C., V]:2.66 CCP-3-1 8.00% LTS (bulk) [−20° C.]: >1000 h PCH-301 2.00% CCVC-3-V6.00%

Example 90

CY-1V-O1V 20.00% Clearing point [° C.]: 81 PY-1V2-O2 5.00% Δn [589 nm,20° C.]: 0.0953 CY-3-O2 7.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 106 CCH-34 10.00% K₁ [pN, 20° C.]:14.5 CC-3-V1 11.00% K₃ [pN, 20° C.]: 18.6 CC-2-V1 11.00% V₀ [20° C., V]:2.63 CCP-3-1 8.00% LTS (bulk) [−20° C.]: >1000 h PCH-301 2.00% CCVC-3-V6.00%

Example 91

CY-1V-O1V 20.00% Clearing point [° C.]: 81.5 PY-1V2-O2 6.00% Δn [589 nm,20° C.]: 0.0947 CY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O2 7.00%ε_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O1 7.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-3-O2 6.00% γ₁ [mPa · s, 20° C.]: 104 CCH-34 10.00% K₁ [pN, 20° C.]:14.6 CC-3-V1 12.00% K₃ [pN, 20° C.]: 18.6 CC-2-V1 12.00% V₀ [20° C., V]:2.64 CCP-V2-1 4.00% CCP-V-1 4.00% CCVC-3-V 6.00%

Example 92

CY-1V-O1V 20.00% Clearing point [° C.]: 80.5 PY-1V2-O2 5.00% Δn [589 nm,20° C.]: 0.0962 CY-3-O2 12.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-4-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.9CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 112 CCH-34 7.00% K₁ [pN, 20° C.]:14.3 CC-3-V1 11.00% K₃ [pN, 20° C.]: 18.5 CC-2-V1 11.00% V₀ [20° C., V]:2.45 CCP-3-1 6.00% CCVC-3-V 8.00%

Example 93

CY-1V-O1V 20.00% Clearing point [° C.]: 81.5 PY-1V2-O2 7.00% Δn [589 nm,20° C.]: 0.0932 CY-3-O2 7.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 10.50%ε_(||) [1 kHz, 20° C.]: 3.4 CCY-4-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CC-3-V2 11.00% γ₁ [mPa · s, 20° C.]: 104 CC-3-V1 11.00% K₁ [pN, 20° C.]:14.9 CC-2-V1 11.00% K₃ [pN, 20° C.]: 19.0 CCP-3-1 6.00% V₀ [20° C., V]:2.55 CCVC-3-V 6.00% LTS (bulk) [−20° C.] >1000 h

Example 94

CY-3-O2 12.00% Clearing point [° C.]: 80.0 PY-1V2-O2 11.00% Δn [589 nm,20° C.]: 0.0950 CCY-3-O2 10.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.3 CPY-3-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 6.4CCH-34 8.00% γ₁ [mPa · s, 20° C.]: 111 CCH-23 22.00% K₁ [pN, 20° C.]:15.1 CCP-3-3 3.00% K₃ [pN, 20° C.]: 16.6 CCP-3-1 7.00% V₀ [20° C., V]:2.46 PCH-301 7.00% LTS (bulk) [−20° C.] >1000 h

Example 95

CY-1V-O1V 18.00% Clearing point [° C.]: 80.5 PY-1V2-O2 4.00% Δn [589 nm,20° C.]: 0.0943 CY-3-O2 15.00% Δε [1 kHz, 20° C.]: −3.6 CCY-3-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-4-O2 7.00% ε_(⊥) [1 kHz, ° C.]: 7.2CPY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 112 CCH-34 7.00% K₁ [pN, 20° C.]:14.2 CC-3-V1 11.00% K₃ [pN, 20° C.]: 18.2 CC-2-V1 11.00% V₀ [20° C., V]:2.37 CCP-3-1 3.00% CCVC-3-V 9.00%

Example 96

CY-1V-O1V 18.00% Clearing point [° C.]: 80.5 PY-1V2-O2 3.00% Δn [589 nm,20° C.]: 0.0946 CY-3-O2 16.00% Δε [1 kHz, 20° C.]: −3.7 CCY-3-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-4-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.2CPY-3-O2 7.00% γ₁ [mPa · s, 20° C.]: 113 CC-3-V2 7.00% K₁ [pN, 20° C.]:14.2 CC-3-V1 11.00% K₃ [pN, 20° C.]: 18.7 CC-2-V1 11.00% V₀ [20° C., V]:2.39 CCP-3-1 3.00% CCVC-3-V 9.00%

Example 97

PY-3-O2 11.00% Clearing point [° C.]: 75 PY-V2-O2 6.50% Δn [589 nm, 20°C.]: 0.1105 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.1 CCY-4-O2 3.00%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-3-01 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.6CPY-2-O2 6.50% γ₁ [mPa · s, 20° C.]: 105 CPY-3-O2 10.00% K₁ [pN, 20°C.]: 13.9 CCH-34 10.00% K₃ [pN, 20° C.]: 14.3 CCH-23 21.00% V₀ [20° C.,V]: 2.28 PYP-2-3 6.00% LTS (bulk) [−20° C.] >1000 h CCP-3-1 3.00%PCH-301 9.00%

Example 98

PY-3-O2 11.00% Clearing point [° C.]: 74 PY-1V2-O2 7.50% Δn [589 nm, 20°C.]: 0.1107 CCY-3-O2 9.00% Δε [1 kHz, 20° C.]: −3.0 CCY-3-O1 5.50%ε_(||) [1 kHz, 20° C.]: 3.4 CPY-2-O2 6.50% ε_(⊥) [1 kHz, 20° C.]: 6.4CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 104 CCH-34 10.00% K₁ [pN, 20° C.]:14.0 CCH-23 21.00% K₃ [pN, 20° C.]: 14.8 PYP-2-3 5.50% V₀ [20° C., V]:2.37 CCP-3-1 4.00% LTS (bulk) [−20° C.] >1000 h PCH-301 10.00%

Example 99

PY-3-O2 11.00% Clearing point [° C.]: 74 PY-1V2-O2 8.00% Δn [589 nm, 20°C.]: 0.1119 CY-3-O2 3.00% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O2 9.00% ε_(||)[1 kHz, 20° C.]: 3.5 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 6.8 CPY-2-O26.50% γ₁ [mPa · s, 20° C.]: 108 CPY-3-O2 10.00% K₁ [pN, 20° C.]: 14.3CCH-34 10.00% K₃ [pN, 20° C.]: 15.0 CCH-23 21.00% V₀ [20° C., V]: 2.26PYP-2-3 5.00% LTS (bulk) [−20° C.] >1000 h CCP-3-1 4.00% PCH-301 6.50%

Example 100

CC-3-V 39.00% Clearing point [° C.]: 74.5 CC-3-V1 3.00% Δn [589 nm, 20°C.]: 0.1017 CCP-V-1 8.00% Δε [1 kHz, 20° C.]: 3.2 CCP-V2-1 12.00% γ₁[mPa · s, 20° C.]: 64 PGP-2-2V 3.50% K₁ [pN, 20° C.]: 13 PP-1-2V1 9.00%K₃ [pN, 20° C.]: 15.4 PPGU-3-F 1.00% V₀ [20° C., V]: 2.13 PUQU-3-F15.50% CCY-3-O2 9.00%

Example 101

BCH-32 5.00% Clearing point [° C.]: 75.3 CC-3-V 41.50% Δn [589 nm, 20°C.]: 0.0989 CC-3-V1 8.50% Δε [1 kHz, 20° C.]: −1.9 CCH-35 2.00% ε_(||)[1 kHz, 20° C.]: 3.2 CCP-3-1 3.00% ε_(⊥) [1 kHz, 20° C.]: 5.0 CCY-3-O27.00% γ₁ [mPa · s, 20° C.]: 69 CPY-2-O2 5.50% K₁ [pN, 20° C.]: 14.2CPY-3-O2 12.50% K₃ [pN, 20° C.]: 15.5 PY-3-O2 15.00% V₀ [20° C., V]:3.02

Example 101a

The mixture from Example 101 is additionally mixed with 0.001% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and 0.3% of RM-1.

Example 102

CCY-3-O1 8.00% Clearing point [° C.]: 74.9 CCY-4-O2 7.50% Δn [589 nm,20° C.]: 0.1123 CPY-2-O2 10.00% Δε [1 kHz, 20° C.]: −3.7 CPY-3-O2 10.00%ε_(||) [1 kHz, 20° C.]: 3.7 CC-3-V 15.00% ε_(⊥) [1 kHz, 20° C.]: 7.5PY-1-O4 5.00% γ₁ [mPa · s, 20° C.]: 121 PY-3-O2 9.00% K₁ [pN, 20° C.]:13.2 PY-4-O2 5.00% K₃ [pN, 20° C.]: 15.5 CC-3-V1 9.00% V₀ [20° C., V]:2.15 CCY-3-O2 6.50% PCH-301 15.00%

Example 102a

The mixture from Example 102 is additionally stabilised with

0.01% of

Example 103

CY-3-O2 10.00% Clearing point [° C.]: 100 CY-3-O4 20.00% Δn [589 nm, 20°C.]: 0.0865 CY-5-O4 20.00% Δε [1 kHz, 20° C.]: −5.4 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.9 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 9.3CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 347 CCY-5-O2 6.00% K₁ [pN, 20° C.]:15.6 CH-33 3.00% K₃ [pN, 20° C.]: 16.6 CH-35 3.50% V₀ [20° C., V]: 1.84CH-43 3.50% CH-45 3.50% CCPC-33 4.00% CCPC-34 4.50% CCPC-35 4.00%

Example 104

CY-3-O2 15.00% Clearing point [° C.]: 91 CY-5-O2 12.00% Δn [589 nm, 20°C.]: 0.105 CCY-3-O1 4.00% Δε [1 kHz, 20° C.]: −4.5 CCY-3-O2 4.00% γ₁[mPa · s, 20° C.]: 106 CCY-3-O3 4.00% V₀ [20° C., V]: 1.32 CCY-4-O24.00% CLY-3-O2 10.00% CLY-3-O3 2.00% CPY-2-O2 8.00% CC-3-V 24.00%PGP-2-5 5.00%

Example 105

CY-3-O2 14.00% Clearing point [° C.]: 84.7 CY-3-O4 4.00% Δn [589 nm, 20°C.]: 0.1068 CY-5-O2 7.00% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O1 4.00% γ₁[mPa · s, 20° C.]: 138 CCY-3-O2 5.00% K₁ [pN, 20° C.]: 14.1 CCY-4-O28.00% K₃ [pN, 20° C.]: 16.2 CCY-5-O2 3.00% V₀ [20° C., V]: 2.13 CPY-2-O29.00% CPY-3-O2 9.00% PYP-2-3 6.00% CC-3-V 22.00% CC-3-V1 3.50% CCP-V-15.00% PPGU-3-F 0.50%

Example 106

CY-3-O2 15.00% Clearing point [° C.]: 80.4 CY-5-O2 12.50% Δn [589 nm,20° C.]: 0.1038 CCY-3-O1 2.50% Δε [1 kHz, 20° C.]: −3.3 CCY-4-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 6.8CPY-3-O2 8.00% γ₁ [mPa · s, 20° C.]: 137 CCY-2-1 6.00% K₁ [pN, 20° C.]:14.2 CCY-3-1 6.00% K₃ [pN, 20° C.]: 14.2 CCH-23 15.00% V₀ [20° C., V]:2.18 CCH-34 5.00% CCH-301 1.50% BCH-32 15.50%

Example 106a

The mixture from Example 106 is additionally mixed with 0.25% of RM-35

and additionally stabilised with0.025% of

Example 107

CC-3-V 34.00% Clearing point [° C.]: 100 CC-3-V1 2.50% Δn [589 nm, 20°C.]: 0.1003 CCP-V-1 10.00% Δε [1 kHz, 20° C.]: 9.1 PUQU-3-F 7.00% ε_(||)[1 kHz, 20° C.]: 12.3 PGUQU-3-F 4.00% ε_(⊥) [1 kHz, 20° C.]: 3.2CPGU-3-OT 6.00% γ₁ [mPa · s, 20° C.]: 99 CCGU-3-F 4.00% K₁ [pN, 20° C.]:14.2 APUQU-3-F 8.00% K₃ [pN, 20° C.]: 17.3 CCP-3F.F.F 4.50% CCP-30CF₃4.00% CCP-50CF₃ 3.00% CCQU-3-F 10.00% CBC-33 3.00%

Example 107a

The mixture from Example 107 is additionally stabilised with

0.03% of

Example 107b

The mixture from Example 107 is additionally stabilised with

0.03% of

Example 108

Y-4O-O4 4.50% Clearing point [° C.]: 100 PYP-2-3 2.00% Δn [589 nm, 20°C.]: 0.1716 CC-3-V 25.00% Δε [1 kHz, 20° C.]: −1.5 CC-4-V 10.00% ε_(||)[1 kHz, 20° C.]: 3.4 CCP-V-1 14.00% ε_(⊥) [1 kHz, 20° C.]: 4.9 PTP-302FF10.00% γ₁ [mPa · s, 20° C.]: 114 CPTP-302FF 10.00% K₁ [pN, 20° C.]: 15.2CPTP-302FF 10.00% K₃ [pN, 20° C.]: 18.5 PPTUI-3-2 14.50% V₀ [20° C., V]:3.76

Example 109

CCH-23 25.00% Clearing point [° C.]: 70.3 CC-3-V 4.50% Δn [589 nm, 20°C.]: 0.0737 PCH-53 25.00% Δε [1 kHz, 20° C.]: −1.1 CCY-2-1 12.00% ε_(||)[1 kHz, 20° C.]: 2.8 CCY-3-1 12.00% ε_(⊥) [1 kHz, 20° C.]: 3.9 CCY-3-O212.00% K₁ [pN, 20° C.]: 11.7 CCY-3-O3 5.00% K₃ [pN, 20° C.]: 13.1CBC-33F 4.50%

Example 110

CC-3-V1 10.25% Clearing point [° C.]: 74.7 CCH-23 18.50% Δn [589 nm, 20°C.]: 0.1027 CCH-35 6.75% Δε [1 kHz, 20° C.]: −3.1 CCP-3-1 6.00% ε_(||)[1 kHz, 20° C.]: 3.4 CCY-3-1 2.50% ε_(⊥) [1 kHz, 20° C.]: 6.5 CCY-3-O212.00% γ₁ [mPa · s, 20° C.]: 104 CPY-2-O2 6.00% K₁ [pN, 20° C.]: 15.4CPY-3-O2 9.75% K₃ [pN, 20° C.]: 16.8 CY-3-O2 11.50% V₀ [20° C., V]: 2.46PP-1-2V1 3.75% PY-3-O2 13.00%

Example 110a

The mixture from Example 110 is additionally mixed with 0.01% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and 0.3% of RM-1.

Example 111

BCH-3F.F 10.00% Clearing point [° C.]: 99.6 BCH-3F.F.F 12.00% Δn [589nm, 20° C.]: 0.1122 CBC-33 3.00% Δε [1 kHz, 20° C.]: 10.1 CBC-33F 3.00%ε_(||) [1 kHz, 20° C.]: 13.8 CCGU-3-F 8.00% ε_(⊥) [1 kHz, 20° C.]: 3.6CCH-34 10.00% γ₁ [mPa · s, 20° C.]: 164 CCH-35 6.50% K₁ [pN, 20° C.]:11.8 CCP-1F.F.F 10.00% K₃ [pN, 20° C.]: 15.9 CCP-2F.F.F 10.00% V₀ [20°C., V]: 1.14 CCP-3-1 2.50% CCP-3F.F.F 8.00% CPGP-4-3 3.00% CPGP-5-22.00% CPGP-5-3 1.00% PUQU-2-F 1.00% PUQU-3-F 10.00%

Example 112

CBC-53F 3.00% Clearing point [° C.]: 115.5 CC-3-2V1 1.00% Δn [589 nm,20° C.]: 0.1106 CC-3-V 25.00% Δε [1 kHz, 20° C.]: 7.0 CC-3-V1 5.00%ε_(||) [1 kHz, 20° C.]: 9.9 CCGU-3-F 5.50% ε_(⊥) [1 kHz, 20° C.]: 2.9CCP-30CF₃ 4.00% γ₁ [mPa · s, 20° C.]: 118 CCP-30CF₃.F 8.00% K₁ [pN, 20°C.]: 17.4 CCP-40CF₃ 3.00% K₃ [pN, 20° C.]: 20.4 CCP-50CF₃ 3.00% V₀ [20°C., V]: 1.66 CCP-V-1 8.00% CCP-V2-1 12.00% CPGU-3-OT 5.00% PGUQU-3-F4.00% PGUQU-4-F 4.00% PGUQU-5-F 2.00% PP-1-2V1 3.00% PPGU-3-F 0.50%PUQU-2-F 1.00% PUQU-3-F 3.00%

Example 113

APUQU-2-F 2.50% Clearing point [° C.]: 85.8 APUQU-3-F 5.00% Δn [589 nm,20° C.]: 0.1106 PUQU-3-F 10.00% Δε [1 kHz, 20° C.]: 8.6 PGUQU-3-F 5.00%ε_(||) [1 kHz, 20° C.]: 12.6 PGUQU-4-F 3.00% ε_(⊥) [1 kHz, 20° C.]: 4.0PGUQU-5-F 2.00% γ₁ [mPa · s, 20° C.]: 92 DPGU-4-F 4.00% K₁ [pN, 20° C.]:13.0 PPGU-3-F 0.50% K₃ [pN, 20° C.]: 15.3 CDUQU-3-F 0.05% V₀ [20° C.,V]: 1.30 CC-3-V 39.95% CCP-V-1 9.00% CCP-V2-1 8.00% CCP-3-1 2.00%PGP-2-3 3.00% CY-3-O2 5.00% CCY-3-O2 5.00%

Example 114

APUQU-2-F 2.50% Clearing point [° C.]: 85.8 APUQU-3-F 5.00% Δn [589 nm,20° C.]: 0.1105 PUQU-3-F 12.50% Δε [1 kHz, 20° C.]: 10.6 PGUQU-3-F 5.00%ε_(||) [1 kHz, 20° C.]: 14.8 PGUQU-4-F 4.00% ε_(⊥) [1 kHz, 20° C.]: 4.2PGUQU-5-F 4.00% γ₁ [mPa · s, 20° C.]: 98 DPGU-4-F 4.00% K₁ [pN, 20° C.]:12.7 PPGU-3-F 0.50% K₃ [pN, 20° C.]: 15.1 CDUQU-3-F 0.05% CC-3-V 34.95%CCP-V-1 7.00% CCP-V2-1 6.00% CCP-3-1 2.50% CCPC-33 2.00% CY-3-O2 5.00%CCY-3-O2 5.00%

Example 115

APUQU-2-F 3.00% Clearing point [° C.]: 85.7 APUQU-3-F 5.00% Δn [589 nm,20° C.]: 0.1097 PUQU-3-F 12.00% Δε [1 kHz, 20° C.]: 8.7 PGUQU-3-F 5.00%ε_(||) [1 kHz, 20° C.]: 12.4 PGUQU-4-F 4.00% ε_(⊥) [1 kHz, 20° C.]: 3.7PGUQU-5-F 3.00% γ₁ [mPa · s, 20° C.]: 82 PPGU-3-F 0.50% K₁ [pN, 20° C.]:12.9 CDUQU-3-F 0.05% K₃ [pN, 20° C.]: 15.7 CC-3-V 38.95% V₀ [20° C., V]:1.29 CCP-V-1 10.50% CCP-V2-1 9.00% PGP-2-3 2.00% CCY-3-O2 3.50% CPY-3-O23.50%

Example 116

APUQU-2-F 3.00% Clearing point [° C.]: 85.7 APUQU-3-F 5.00% Δn [589 nm,20° C.]: 0.1097 PUQU-3-F 12.00% Δε [1 kHz, 20° C.]: 8.7 PGUQU-3-F 5.00%ε_(||) [1 kHz, 20° C.]: 12.4 PGUQU-4-F 4.00% ε_(⊥) [1 kHz, 20° C.]: 3.7PGUQU-5-F 3.00% γ₁ [mPa · s, 20° C.]: 82 PPGU-3-F 0.50% K₁ [pN, 20° C.]:12.9 CDUQU-3-F 0.05% K₃ [pN, 20° C.]: 15.7 CC-3-V 38.95% V₀ [20° C., V]:1.29 CCP-V-1 10.50% CCP-V2-1 9.00% PGP-2-3 2.00% CCY-3-O2 3.50% CPY-3-O23.50%

Example 117

CC-3-V 35.00% Clearing point [° C.]: 84.6 CCY-3-O1 9.00% Δn [589 nm, 20°C.]: 0.1010 CCY-3-O2 8.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.6 CLY-3-O3 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.6CPY-2-O2 9.50% γ₁ [mPa · s, 20° C.]: 114 CPY-3-O2 4.00% K₁ [pN, 20° C.]:14.5 CY-3-O2 6.50% PY-3-O2 12.00%

Example 117a

The mixture from Example 117 is additionally stabilised with

0.04% of

and0.015% of

Example 118

CC-3-V 33.00% Clearing point [° C.]: 84 CCY-3-O1 7.00% Δn [589 nm, 20°C.]: 0.1111 CCY-3-O2 7.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 5.00%ε_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O3 11.00% ε_(⊥) [1 kHz, 20° C.]: 7.6CPY-2-O2 9.00% γ₁ [mPa · s, 20° C.]: 119 CPY-3-O2 8.00% K₁ [pN, 20° C.]:14.8 PP-1-2V1 1.50% PY-1-O4 8.50% PY-3-O2 10.00%

Example 118a

The mixture from Example 118 is additionally stabilised with

0.04% of

and0.015% of

Example 119

APUQU-2-F 4.00% Clearing point [° C.]: 85.6 APUQU-3-F 7.00% Δn [589 nm,20° C.]: 0.1021 PUQU-3-F 5.00% Δε [1 kHz, 20° C.]: 6.9 PGUQU-3-F 4.00%ε_(||) [1 kHz, 20° C.]: 10.0 PGUQU-4-F 3.00% ε_(⊥) [1 kHz, 20° C.]: 3.1PGUQU-5-F 3.00% γ₁ [mPa · s, 20° C.]: 71 CCP-V-1 16.00% K₁ [pN, 20° C.]:13.1 CC-3-V 40.00% K₃ [pN, 20° C.]: 15.3 CC-3-V1 4.00% V₀ [20° C., V]:1.45 CC-4-V 3.00% PGP-2-3 4.00% PGP-2-4 1.00% PPGU-3-F 1.00% CCOC-4-35.00%

Example 119a

The mixture from Example 119 is additionally mixed with 0.25% of RM-41

Example 119b

The mixture from Example 119 is additionally mixed with 0.3% of RM-17

Example 120

Y-4O-O4 12.00% Clearing point [° C.]: 101 CY-3-O2 14.00% Δn [589 nm, 20°C.]: 0.1504 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −6.2 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 4.5 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 10.7CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 281 CPY-2-O2 2.50% K₁ [pN, 20° C.]:15.7 PTP-302FF 10.00% K₃ [pN, 20° C.]: 19.9 CPTP-302FF 10.00% V₀ [20°C., V]: 1.90 CPTP-502FF 10.00% CC-4-V 2.50% CCP-V-1 11.50% CCPC-33 4.50%

Example 121

Y-4O-O4 12.00% Clearing point [° C.]: 100 CCY-3-O1 5.00% Δn [589 nm, 20°C.]: 0.1496 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.1 CCY-3-O3 6.00%ε_(||) [1 kHz, 20° C.]: 4.0 CCY-4-O2 2.00% ε_(⊥) [1 kHz, 20° C.]: 8.1CC-4-V 15.00% γ₁ [mPa · s, 20° C.]: 180 CCP-V-1 11.00% K₁ [pN, 20° C.]:16.1 CCP-V2-1 5.00% K₃ [pN, 20° C.]: 18.5 BCH-32 5.00% V₀ [20° C., V]:2.25 PTP-302FF 10.00% PTP-502FF 3.00% CPTP-302FF 10.00% CPTP-502FF10.00%

Example 122

Y-4O-O4 10.00% Clearing point [° C.]: 100 CCY-3-O1 2.50% Δn [589 nm, 20°C.]: 0.1515 PTP-302FF 10.00% Δε [1 kHz, 20° C.]: −2.1 PTP-502FF 3.50%ε_(||) [1 kHz, 20° C.]: 3.5 CPTP-302FF 10.00% ε_(⊥) [1 kHz, 20° C.]: 5.6CPTP-502FF 3.50% γ₁ [mPa · s, 20° C.]: 125 CC-4-V 15.00% K₁ [pN, 20°C.]: 16.6 CC-3-V1 8.00% K₃ [pN, 20° C.]: 18.7 CCP-V-1 12.00% V₀ [20° C.,V]: 3.13 CCP-V2-1 12.00% BCH-32 5.00% CPTP-3-1 5.00% CPTP-3-2 3.50%

Example 123

Y-4O-O4 12.00% Clearing point [° C.]: 101 CY-3-O2 6.00% Δn [589 nm, 20°C.]: 0.1218 CY-3-O4 15.00% Δε [1 kHz, 20° C.]: −6.2 CCY-3-O2 6.00%ε_(||) [1 kHz, 20° C.]: 4.5 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 10.7CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 302 CLY-3-O2 5.00% K₁ [pN, 20° C.]:15.7 CPY-2-O2 8.00% K₃ [pN, 20° C.]: 18.9 CPY-3-O2 8.00% V₀ [20° C., V]:1.83 CPTP-302FF 4.00% CPTP-502FF 4.00% CCP-V-1 11.00% CCPC-33 4.50%CCPC-34 4.50%

Example 124

Y-4O-O4 15.00% Clearing point [° C.]: 101 CCY-3-O2 5.00% Δn [589 nm, 20°C.]: 0.1216 CCY-3-O3 5.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 5.00%ε_(||) [1 kHz, 20° C.]: 4.0 CLY-3-O2 4.00% ε_(⊥) [1 kHz, 20° C.]: 8.0CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 167 CPY-3-O2 8.00% K₁ [pN, 20° C.]:16.1 CPTP-302FF 5.00% K₃ [pN, 20° C.]: 17.3 CPTP-502FF 5.00% V₀ [20° C.,V]: 2.19 CC-4-V 13.50% CCP-V-1 11.50% CCP-V2-1 10.00% BCH-32 5.00%

Example 125

Y-4O-O4 10.00% Clearing point [° C.]: 100 CCY-3-O2 5.00% Δn [589 nm, 20°C.]: 0.1203 CCY-3-O3 3.50% Δε [1 kHz, 20° C.]: −2.0 CPY-3-O2 5.50%ε_(||) [1 kHz, 20° C.]: 3.4 PTP-302FF 3.50% ε_(⊥) [1 kHz, 20° C.]: 5.4CPTP-302FF 5.00% γ₁ [mPa · s, 20° C.]: 117 CPTP-502FF 5.00% K₁ [pN, 20°C.]: 15.6 CCH-301 5.00% K₃ [pN, 20° C.]: 18.5 CC-4-V 15.00% V₀ [20° C.,V]: 3.17 CC-3-V1 8.00% CCP-V-1 13.00% CCP-V2-1 13.00% BCH-32 5.00%CPTP-3-1 3.50%

Example 126

BCH-32 16.00% Clearing point [° C.]: 10.5 BCH-52 6.50% Δn [589 nm, 20°C.]: 0.1503 CCY-3-O1 5.00% Δε [1 kHz, 20° C.]: −4.2 CCY-3-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.8 CCY-3-O3 6.00% ε_(⊥) [1 kHz, 20° C.]: 8.0CCY-4-O2 8.00% γ₁ [mPa · s, 20° C.]: 297 CCY-5-O2 7.00% K₁ [pN, 20° C.]:18.3 CY-3-O4 13.00% K₃ [pN, 20° C.]: 17.3 PY-3-O2 5.50% V₀ [20° C., V]:2.13 PY-4-O2 9.00% PYP-2-3 8.00% PYP-2-4 8.00%

Example 126a

The mixture from Example 126 is additionally stabilised with

0.015% of

and0.015% of

Example 127

CC-3-V 35.50% Clearing point [° C.]: 79.8 CCY-3-O2 6.00% Δn [589 nm, 20°C.]: 0.0962 CCY-3-O3 6.00% Δε [1 kHz, 20° C.]: −3.4 CCY-4-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.6 CCY-5-O2 3.50% ε_(⊥) [1 kHz, 20° C.]: 7.0CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 111 CPY-3-O2 9.00% K₁ [pN, 20°C.]: 13.3 CY-3-O4 10.00% K₃ [pN, 20° C.]: 15.2 CY-5-O2 9.00% V₀ [20° C.,V]: 2.23 PGIGI-3-F 5.00%

Example 128

CC-3-V 31.50% Clearing point [° C.]: 79.6 CCP-V-1 5.00% Δn [589 nm, 20°C.]: 0.1044 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −3.4 CCY-3-O3 6.00%ε_(||) [1 kHz, 20° C.]: 3.6 CCY-4-O2 5.50% ε_(⊥) [1 kHz, 20° C.]: 7.0CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 115 CPY-3-O2 10.00% K₁ [pN, 20°C.]: 13.3 CY-3-O4 7.00% K₃ [pN, 20° C.]: 15.2 CY-5-O2 7.00% V₀ [20° C.,V]: 2.24 PGIGI-3-F 5.00% PY-3-O2 7.00%

Example 129

CC-3-V 36.50% Clearing point [° C.]: 84.9 CCP-V-1 3.00% Δn [589 nm, 20°C.]: 0.1054 CCY-3-O1 6.50% Δε [1 kHz, 20° C.]: −3.5 CCY-3-O2 3.50%ε_(||) [1 kHz, 20° C.]: 3.5 CCY-4-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 7.0CLY-3-O3 9.00% γ₁ [mP · s, 20° C.]: 108 CPY-2-O2 11.00% K₁ [pN, 20° C.]:14.4 CPY-3-O2 9.00% K₃ [pN, 20° C.]: 15.7 CY-3-O2 3.00% V₀ [20° C., V]:2.24 PY-3-O2 13.50%

Example 130

CC-3-V 39.00% Clearing point [° C.]: 75.2 BCH-3F.F.F 8.00% Δn [589 nm,20° C.]: 0.1298 PGU-2-F 6.00% Δε [1 kHz, 20° C.]: 18.3 PGU-3-F 6.00%ε_(||) [1 kHz, 20° C.]: 22.6 APUQU-2-F 6.00% ε_(⊥) [1 kHz, 20° C.]: 4.3APUQU-3-F 8.00% γ₁ [mPa · s, 20° C.]: 99 PGUQU-3-F 6.00% K₁ [pN, 20°C.]: 10.9 PGUQU-4-F 6.00% K₃ [pN, 20° C.]: 11.1 PGUQU-5-F 6.00% V₀ [20°C., V]: 0.81 DPGU-4-F 9.00%

Example 131

CC-3-V 38.50% Clearing point [° C.]: 74.9 CCY-3-O1 4.50% Δn [589 nm, 20°C.]: 0.1012 CCY-3-O2 4.00% Δε [1 kHz, 20° C.]: −3.7 CCY-4-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.4CPY-2-O2 10.00% γ₁ [mPa · s, 20° C.]: 94 CPY-3-O2 9.00% K₁ [pN, 20° C.]:13.4 PY-1-O4 7.50% K₃ [pN, 20° C.]: 14.4 PY-3-O2 6.00% V₀ [20° C., V]:2.08 Y-4O-O4 4.50% LTS (bulk) [−20° C.] >1000 h

Example 131a

The mixture from Example 131 is additionally mixed with

0.25% of

and0.25% of

Example 132

CC-3-V 40.50% Clearing point [° C.]: 74.8 CC-3-V1 5.00% Δn [589 nm, 20°C.]: 0.1073 CCPC-33 3.00% Δε [1 kHz, 20° C.]: −1.9 CCY-3-O2 9.00% ε_(||)[1 kHz, 20° C.]: 3.2 CPY-2-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 5.2 CPY-3-O29.50% γ₁ [mPa · s, 20° C.]: 63 PP-1-2V1 6.00% K₁ [pN, 20° C.]: 12.6PY-3-O2 7.00% K₃ [pN, 20° C.]: 14.1 PYP-2-3 8.00% V₀ [20° C., V]: 2.86Y-4O-O4 3.00%

Example 132a

The mixture from Example 132 is additionally stabilised with

0.04% of

and0.02% of

Example 133

APUQU-2-F 2.50% Clearing point [° C.]: 97.5 APUQU-3-F 7.00% Δn [589 nm,20° C.]: 0.1000 PGUQU-3-F 4.00% Δε [1 kHz, 20° C.]: 8.0 PGUQU-4-F 4.00%ε_(||) [1 kHz, 20° C.]: 11.1 PUQU-3-F 4.00% ε_(⊥) [1 kHz, 20° C.]: 3.1CCP-V-1 6.00% γ₁ [mPa · s, 20° C.]: 93 CCP-V2-1 14.00% K₁ [pN, 20° C.]:15.3 CCGU-3-F 3.50% K₃ [pN, 20° C.]: 17.6 CCQU-3-F 10.00% V₀ [20° C.,V]: 1.45 PCH-302 6.50% CC-3-V 25.00% CC-3-V1 8.00% CCP-30CF₃ 5.00%PPGU-3-F 0.50%

Example 133a

The mixture from Example 133 is additionally mixed with

0.25% of

Example 134

CY-3-O2 18.50% Clearing point [° C.]: 80 CCY-3-O2 11.00% Δn [589 nm, 20°C.]: 0.0896 CCY-4-O2 9.00% Δε [1 kHz, 20° C.]: −3.4 CPY-2-O2 7.50%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-3-O2 9.00% ε_(⊥) [1 kHz, 20° C.]: 6.9CCH-34 9.00% γ₁ [mPa · s, 20° C.]: 117 CCH-35 9.00% K₁ [pN, 20° C.]:14.4 CC-3-V 10.00% K₃ [pN, 20° C.]: 15.1 CCH-301 9.00% V₀ [20° C., V]:2.23 CCH-303 5.00% PYP-2-3 3.00%

Example 134a

The mixture from Example 134 is additionally mixed with

0.2% of

Example 135

CY-3-O2 10.50% Clearing point [° C.]: 79.7 PY-1-O4 5.00% Δn [589 nm, 20°C.]: 0.1113 PY-3-O2 7.50% Δε [1 kHz, 20° C.]: −4.4 PY-4-O2 4.00% K₁ [pN,20° C.]: 14.5 CCY-3-O1 5.50% K₃ [pN, 20° C.]: 16.7 CCY-3-O2 5.00% V₀[20° C., V]: 2.05 CCY-4-O2 4.00% CLY-3-O2 9.00% CPY-2-O2 9.00% CPY-3-O29.00% CC-3-V 23.50% CC-3-V1 7.00% CBC-33F 1.00%

Example 136

APUQU-3-F 3.00% Clearing point [° C.]: 90.5 CC-3-V1 7.75% Δn [589 nm,20° C.]: 0.1057 CC-4-V 10.00% Δε [1 kHz, 20° C.]: 7.4 CC-5-V 9.25% γ₁[mPa · s, 20° C.]: 91 CCGU-3-F 7.00% K₁ [pN, 20° C.]: 13.6 CCH-34 3.00%K₃ [pN, 20° C.]: 15.5 CCP-30CF₃ 2.50% V₀ [20° C., V]: 1.43 CCP-V-114.00% CCP-V2-1 9.50% PCH-301 11.00% PGP-2-2V 2.00% PGUQU-3-F 5.00%PPGU-3-F 0.50% PUQU-3-F 12.00% APUQU-2-F 3.50%

Example 137

CC-3-V 27.00% Clearing point [° C.]: 74.9 CCY-3-1 9.50% Δn [589 nm, 20°C.]: 0.1093 CCP-3-1 8.00% Δε [1 kHz, 20° C.]: −3.8 CLY-3-O2 6.00% ε_(||)[1 kHz, 20° C.]: 3.7 CPY-2-O2 10.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CPY-3-O210.50% γ₁ [mPa · s, 20° C.]: 108 CY-3-O2 15.00% K₁ [pN, 20° C.]: 14.1PY-3-O2 13.50% K₃ [pN, 20° C.]: 15.8 V₀ [20° C., V]: 2.16

Example 138

CC-3-V 16.00% Clearing point [° C.]: 85.4 CC-3-V1 5.00% Δn [589 nm, 20°C.]: 0.1060 CCH-34 7.00% Δε [1 kHz, 20° C.]: −3.7 CCP-3-1 1.00% ε_(||)[1 kHz, 20° C.]: 3.6 CCY-3-O1 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.4 CCY-3-O27.50% γ₁ [mPa · s, 20° C.]: 114 CCY-3-O3 2.00% K₁ [pN, 20° C.]: 13.4CCY-4-O2 5.00% K₃ [pN, 20° C.]: 14.5 CPY-2-O2 10.00% V₀ [20° C., V]:2.09 CPY-3-O2 9.00% CY-3-O2 10.00% CY-3-O4 6.50% CY-5-O4 6.00% PYP-2-35.50% PYP-2-4 3.50%

Example 138a

The mixture from Example 138 is additionally stabilised with

0.04% of

Example 139

CCH-23 12.00% Clearing point [° C.]: 110.7 CCH-34 10.00% Δn [589 nm, 20°C.]: 0.1002 CCP-3-1 7.00% Δε [1 kHz, 20° C.]: −2.9 CCY-3-1 10.00% ε_(||)[1 kHz, 20° C.]: 3.2 CCY-3-O1 1.50% ε_(⊥) [1 kHz, 20° C.]: 6.1 CCY-3-O29.00% γ₁ [mPa · s, 20° C.]: 147 CCY-3-O3 7.50% K₁ [pN, 20° C.]: 17.3CCY-4-O2 9.00% K₃ [pN, 20° C.]: 18.3 CPGP-4-3 2.00% V₀ [20° C., V]: 2.65CPY-2-O2 8.00% CPY-3-O2 8.00% CY-3-O2 1.50% CY-3-O4 3.00% PCH-301 10.00%PYP-2-3 1.50%

Example 139a

The mixture from Example 139 is additionally stabilised with

0.04% of

Example 140

BCH-32 1.50% Clearing point [° C.]: 74.3 CC-3-V 19.50% Δn [589 nm, 20°C.]: 0.1089 CC-3-V1 5.50% Δε [1 kHz, 20° C.]: −3.8 CCP-3-1 8.00% ε_(||)[1 kHz, 20° C.]: 3.7 CCP-3-3 4.50% ε_(⊥) [1 kHz, 20° C.]: 7.5 CLY-3-O26.00% γ₁ [mPa · s, 20° C.]: 115 CPY-2-O2 10.50% K₁ [pN, 20° C.]: 13.7CPY-3-O2 10.50% K₃ [pN, 20° C.]: 16.1 CY-3-O2 15.00% V₀ [20° C., V]:2.18 CY-5-O2 9.00% PY-3-O2 10.00%

Example 141

CY-3-O2 15.00% Clearing point [° C.]: 74.7 CY-5-O2 6.50% Δn [589 nm, 20°C.]: 0.1082 CCY-3-O2 11.00% Δε [1 kHz, 20° C.]: −3.0 CPY-2-O2 5.50%ε_(||) [1 kHz, 20° C.]: 3.6 CPY-3-O2 10.50% ε_(⊥) [1 kHz, 20° C.]: 6.6CC-3-V 28.50% γ₁ [mPa · s, 20° C.]: 97 CC-3-V1 10.00% K₁ [pN, 20° C.]:12.9 PYP-2-3 12.50% K₃ [pN, 20° C.]: 15.7 PPGU-3-F 0.50% V₀ [20° C., V]:2.42

Example 142

PGUQU-3-F 5.00% Clearing point [° C.]: 84.8 CCQU-3-F 8.00% Δn [589 nm,20° C.]: 0.1035 CCQU-5-F 4.00% Δε [1 kHz, 20° C.]: 10.1 PUQU-3-F 13.50%ε_(||) [1 kHz, 20° C.]: 13.5 APUQU-2-F 3.00% ε_(⊥) [1 kHz, 20° C.]: 3.4APUQU-3-F 6.00% γ₁ [mPa · s, 20° C.]: 86 CC-3-V 25.50% K₁ [pN, 20° C.]:12.3 CC-3-V1 6.00% K₃ [pN, 20° C.]: 15.0 CCP-V-1 13.00% V₀ [20° C., V]:1.17 CCP-V2-1 6.00% PPGU-3-F 0.50% BCH-3F.F 7.50% BCH-2F.F 2.00%

Example 142a

The mixture from Example 142 is additionally mixed with

0.25% of

Example 143

CY-3-O2 12.00% Clearing point [° C.]: 85.4 CY-5-O2 12.00% Δn [589 nm,20° C.]: 0.1039 CCY-3-O3 5.00% CCY-4-O2 5.00% CPY-2-O2 10.00% CPY-3-O210.00% CCY-2-1 4.00% CC-3-V 16.00% CCH-23 10.00% CCH-34 4.00% CCP-V-14.00% PGP-2-5 2.00% CPGP-5-2 3.00% CPGP-5-3 3.00%

Example 144

CC-3-V 41.50% Clearing point [° C.]: 74.5 CCY-3-O1 2.50% Δn [589 nm, 20°C.]: 0.0984 CCY-3-O2 11.50% Δε [1 kHz, 20° C.]: −3.3 CCY-3-O3 5.00%ε_(||) [1 kHz, 20° C.]: 3.5 CPY-2-O2 5.00% ε_(⊥) [1 kHz, 20° C.]: 6.7CPY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 89 CY-3-O2 9.50% K₁ [pN, 20° C.]:13.2 PY-3-O2 7.00% K₃ [pN, 20° C.]: 15.2 PY-4-O2 3.00% V₀ [20° C., V]:2.29 PYP-2-3 3.00%

Example 144a

The mixture from Example 144 is additionally mixed with 0.001% ofIrganox® 1076 (octadecyl3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, BASF) and additionallywith

0.4% of

Example 145

CC-3-V 30.50% Clearing point [° C.]: 80.1 CC-3-V1 4.50% Δn [589 nm, 20°C.]: 0.1033 CCY-3-O1 6.00% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O2 8.00%ε_(||) [1 kHz, 20° C.]: 3.6 CLY-3-O2 8.00% ε_(⊥) [1 kHz, 20° C.]: 7.6CPY-2-O2 8.00% γ₁ [mPa · s, 20° C.]: 113 CPY-3-O2 12.00% K₁ [pN, 20°C.]: 14.4 CY-3-O2 15.00% K₃ [pN, 20° C.]: 17.0 PY-3-O2 8.00% V₀ [20° C.,V]: 2.16

Example 146

CC-3-V 41.50% Clearing point [° C.]: 74.5 CCY-3-O1 2.50% Δε [1 kHz, 20°C.]: −3.3 CCY-3-O2 11.50% K₁ [pN, 20° C.]: 13.2 CCY-3-O3 5.00% K₃ [pN,20° C.]: 15.2 CPY-2-O2 5.00% V₀ [20° C., V]: 2.29 CPY-3-O2 12.00%CY-3-O2 9.50% PY-3-O2 7.00% PY-4-O2 3.00% PYP-2-3 3.00%

Example 147

CC-3-V 26.00% Clearing point [° C.]: 80.5 CCY-3-O2 6.00% Δn [589 nm, 20°C.]: 0.1040 CCY-3-O3 6.00% Δε [1 kHz, 20° C.]: −4.0 CCY-4-O2 6.00%ε_(||) [1 kHz, 20° C.]: 3.7 CCY-5-O2 6.00% ε_(⊥) [1 kHz, 20° C.]: 7.7CPY-2-O2 6.00% γ₁ [mPa · s, 20° C.]: 133 CPY-3-O2 6.00% K₁ [pN, 20° C.]:13.6 PYP-2-3 7.00% K₃ [pN, 20° C.]: 15.4 CY-3-O2 15.00% V₀ [20° C., V]:2.07 CY-5-O2 12.00% LTS (bulk) [−20° C.] >1000 h BCH-32 4.00%

Example 147a

The mixture from Example 147 is additionally mixed with

0.3% of

Example 148

CC-3-V 26.50% Clearing point [° C.]: 84.6 CC-3-V1 2.00% Δn [589 nm, 20°C.]: 0.1076 CCH-34 2.00% Δϵ [1 kHz, 20° C.]: −4.0 CCY-3-O2 10.00% ϵ_(||)[1 kHz, 20° C.]: 3.7 CCY-3-O3 5.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.7 CCY-4-O210.00% γ₁ [mPa · s, 20° C.]: 129 CPY-2-O2 10.00% K₁ [pN, 20° C.]: 13.9CPY-3-O2 10.00% K₃ [pN, 20° C.]: 15.4 CY-3-O2 10.50% V₀ [20° C., V]:2.06 PYP-2-3 9.00% Y-4O-O4 5.00%

Example 148a

The mixture from Example 148 is additionally stabilised with

0.04% of

and0.015% of

Example 149

APUQU-3-F 1.50% Clearing point [° C.]: 110.1 CC-3-V 34.00% Δn [589 nm,20° C.]: 0.1208 CC-3-V1 5.00% Δε [1 kHz, 20° C.]: 6.2 CCP-30CF₃ 4.50%ε_(||) [1 kHz, 20° C.]: 9.2 CCP-V-1 10.50% ε_(⊥) [1 kHz, 20° C.]: 3.0CCP-V2-1 6.00% γ₁ [mPa · s, 20° C.]: 104 CCVC-3-V 3.50% K₁ [pN, 20° C.]:16.3 CPGP-5-2 4.50% K₃ [pN, 20° C.]: 18.9 CPGP-5-3 4.50% V₀ [20° C., V]:1.70 DGUQU-4-F 3.00% PGP-2-3 4.00% PGP-2-4 2.00% PGUQU-3-F 5.00%PGUQU-4-F 3.50% PGUQU-5-F 3.00% PPGU-3-F 0.50% PUQU-3-F 5.00%

Example 150

APUQU-3-F 1.50% Clearing point [° C.]: 110 CC-3-V 35.50% Δn [589 nm, 20°C.]: 0.1257 CCP-30CF₃ 4.00% Δε [1 kHz, 20° C.]: 6.3 CCP-V-1 12.00%ε_(||) [1 kHz, 20° C.]: 9.3 CCP-V2-1 4.50% ε_(⊥) [1 kHz, 20° C.]: 3.0CCVC-3-V 4.00% γ₁ [mPa · s, 20° C.]: 104 CPGP-5-2 5.00% K₁ [pN, 20° C.]:16.1 CPGP-5-3 5.00% K₃ [pN, 20° C.]: 18.7 DGUQU-4-F 3.00% V₀ [20° C.,V]: 1.69 PGP-2-3 4.00% PGP-2-4 2.00% PGUQU-3-F 5.00% PGUQU-4-F 3.50%PGUQU-5-F 3.00% PPGU-3-F 0.50% PUQU-3-F 5.00% PP-1-2V1 2.50%

Example 151

CY-3-O2 5.00% Clearing point [° C.]: 102 CY-3-O4 15.00% Δn [589 nm, 20°C.]: 0.2503 CCY-3-O2 6.00% Δε [1 kHz, 20° C.]: −4.0 CCY-3-O3 6.00%ε_(||) [1 kHz, 20° C.]: 4.3 CPY-2-O2 3.00% ε_(⊥) [1 kHz, 20° C.]: 8.3PTP-102 5.00% γ₁ [mPa · s, 20° C.]: 392 PPTUI-3-2 15.00% K₁ [pN, 20°C.]: 19.5 PPTUI-3-4 11.00% K₃ [pN, 20° C.]: 24.0 PTP-302FF 12.00% V₀[20° C., V]: 2.57 PTP-502FF 12.00% CPTP-302FF 5.00% CPTP-502FF 5.00%

Example 152

CC-3-V 35.00% Clearing point [° C.]: 79.6 CCP-3-1 7.50% Δn [589 nm, 20°C.]: 0.1095 CCPC-33 2.00% Δε [1 kHz, 20° C.]: −2.6 CCY-3-O2 7.00% ε_(||)[1 kHz, 20° C.]: 3.5 CCY-4-O2 7.50% ε_(⊥) [1 kHz, 20° C.]: 6.1 CPY-2-O28.50% γ₁ [mPa · s, 20° C.]: 92 CPY-3-O2 9.00% K₁ [pN, 20° C.]: 14.5PP-1-2V1 5.50% PY-3-O2 8.00% PYP-2-3 5.00% Y-4O-O4 5.00%

Example 152a

The mixture from Example 152 is additionally stabilised with

0.04% of

and0.02% of

Example 153

CY-3-O4 25.00% Clearing point [° C.]: 81.2 CY-5-O2 9.00% Δn [589 nm, 20°C.]: 0.1531 CCY-3-O2 7.00% Δε [1 kHz, 20° C.]: −5.0 CCY-3-O3 4.50%ε_(||) [1 kHz, 20° C.]: 4.1 CPY-2-O2 10.00% ε_(⊥) [1 kHz, 20° C.]: 9.1CPY-3-O2 10.00% γ₁ [mPa · s, 20° C.]: 298 PYP-2-3 14.00% K₁ [pN, 20°C.]: 13.1 PYP-2-4 10.00% K₃ [pN, 20° C.]: 15.9 CCP-V-1 3.00% V₀ [20° C.,V]: 1.89 BCH-32 2.00% PP-1-2V1 3.50% PGP-2-3 2.00%

Example 153a

The mixture from Example 153 is additionally mixed with

10% of

Example 154

CC-3-V 29.00% Clearing point [° C.]: 80.1 CCY-3-O1 8.00% Δn [589 nm, 20°C.]: 0.1033 CCY-3-O2 6.00% Δϵ [1 kHz, 20° C.]: −4.5 CCY-4-O2 2.00%ϵ_(||) [1 kHz, 20° C.]: 4.0 CLY-3-O2 8.50% ϵ_(⊥) [1 kHz, 20° C.]: 8.4CLY-3-O3 7.50% γ₁ [mPa · s, 20° C.]: 98 CPY-2-O2 10.00% K₁ [pN, 20° C.]:13.2 CPY-3-O2 7.50% K₃ [pN, 20° C.]: 14.6 CY-3-O2 6.50% V₀ [20° C., V]:1.91 PY-3-O2 10.00% Y-4O-O4 5.00%

Example 154a

The mixture from Example 154 is additionally stabilised with

0.04% of

and0.02% of

Example 155

CC-3-V 34.00% Clearing point [° C.]: 79.7 CCPC-33 1.00% Δn [589 nm, 20°C.]: 0.1095 CCY-3-1 4.00% Δϵ [1 kHz, 20° C.]: −3.5 CCY-3-O2 10.00%ϵ_(||) [1 kHz, 20° C.]: 3.7 CCY-4-O2 9.50% ϵ_(⊥) [1 kHz, 20° C.]: 7.2CPY-2-O2 9.00% γ₁ [mPa · s, 20° C.]: 105 CPY-3-O2 10.00% K₁ [pN, 20°C.]: 14.0 PP-1-2V1 1.50% PY-3-O2 10.00% PYP-2-3 6.00% Y-4O-O4 5.00%

Example 155a

The mixture from Example 155 is additionally stabilised with

0.04% of

and0.02% of

Example 156

CC-3-V 19.00% Clearing point [° C.]: 80.2 CCY-3-O1 5.00% Δn [589 nm, 20°C.]: 0.1104 CCY-3-O2 7.00% Δϵ [1 kHz, 20° C.]: −3.7 CCY-3-O3 12.00%ϵ_(||) [1 kHz, 20° C.]: 3.6 CCY-4-O2 8.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.3CPY-2-O2 9.50% γ₁ [mPa · s, 20° C.]: 143 CPY-3-O2 10.00% K₁ [pN, 20°C.]: 12.9 CY-3-O2 12.00% K₃ [pN, 20° C.]: 14.5 CY-3-O4 3.50% V₀ [20° C.,V]: 2.09 PP-1-3 7.00% PP-1-4 7.00%

Example 157

CY-3-O2 15.00% Clearing point [° C.]: 79.1 CY-5-O2 9.50% Δn [589 nm, 20°C.]: 0.0944 CCY-3-O1 4.00% Δϵ [1 kHz, 20° C.]: −4.0 CCY-3-O2 6.00%ϵ_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O3 4.50% ϵ_(⊥) [1 kHz, 20° C.]: 7.7CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 120 CCY-5-O2 4.00% K₁ [pN, 20° C.]:13.4 CPY-2-O2 8.00% K₃ [pN, 20° C.]: 15.4 CPY-3-O2 9.00% V₀ [20° C., V]:2.06 PYP-2-4 2.00% CC-3-V 32.00%

Example 157a

The mixture from Example 157 is additionally stabilised with

0.015% of

Example 158

CY-3-O2 15.00% Clearing point [° C.]: 79.1 CY-5-O2 9.50% Δn [589 nm, 20°C.]: 0.0944 CCY-3-O1 4.00% Δϵ [1 kHz, 20° C.]: −4.0 CCY-3-O2 6.00%ϵ_(||) [1 kHz, 20° C.]: 3.7 CCY-3-O3 4.50% ϵ_(⊥) [1 kHz, 20° C.]: 7.7CCY-4-O2 6.00% γ₁ [mPa · s, 20° C.]: 120 CCY-5-O2 4.00% K₁ [pN, 20° C.]:13.4 CPY-2-O2 8.00% K₃ [pN, 20° C.]: 15.4 CPY-3-O2 9.00% V₀ [20° C., V]:2.06 PYP-2-4 2.00% CC-3-V 32.00%

Example 158a

The mixture from Example 158 is additionally stabilised with

0.015% of

Example 159

APUQU-3-F 4.00% Clearing point [° C.]: 85.7 CC-3-V 41.00% Δn [589 nm,20° C.]: 0.1004 CC-3-V1 6.50% Δϵ [1 kHz, 20° C.]: 6.8 CCP-V-1 12.00%ϵ_(||) [1 kHz, 20° C.]: 9.8 CCP-V2-1 11.00% ϵ_(⊥) [1 kHz, 20° C.]: 3.0CPGP-5-3 2.50% γ₁ [mPa · s, 20° C.]: 69 PGUQU-3-F 5.00% K₁ [pN, 20° C.]:13.0 PGUQU-4-F 4.00% K₃ [pN, 20° C.]: 16.6 PGUQU-5-F 3.50% V₀ [20° C.,V]: 1.47 PUQU-3-F 10.50%

Example 160

CC-3-V 32.50% Clearing point [° C.]: 74.7 CC-3-V1 1.50% Δn [589 nm, 20°C.]: 0.1090 CCY-3-O1 8.50% Δϵ [1 kHz, 20° C.]: −3.8 CCY-3-O2 5.50%ϵ_(||) [1 kHz, 20° C.]: 3.7 CLY-3-O2 10.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.5CPY-3-O2 9.50% γ₁ [mPa · 20° C.]: 102 PY-3-O2 10.50% K₁ [pN, 20° C.]:13.8 CY-3-O2 14.00% K₃ [pN, 20° C.]: 15.7 PYP-2-3 8.00% V₀ [20° C., V]:2.15

Example 161

CC-3-V 33.00% Clearing point [° C.]: 80.2 CCY-3-O1 6.00% Δn [589 nm, 20°C.]: 0.1116 CCY-3-O2 8.00% Δϵ [1 kHz, 20° C.]: −4.1 CCY-4-O2 2.50%ϵ_(||) [1 kHz, 20° C.]: 3.7 CPY-2-O2 8.00% ϵ_(⊥) [1 kHz, 20° C.]: 7.8CPY-3-O2 12.00% γ₁ [mPa · s, 20° C.]: 119 CLY-3-O2 8.00% K₁ [pN, 20°C.]: 14.5 PY-1-O4 1.50% K₃ [pN, 20° C.]: 16.1 PY-3-O2 10.00% V₀ [20°C.,]: 2.09 PY-4-O2 8.00% CY-3-O2 3.00%

Example 161a

The mixture from Example 161 is additionally stabilised with

0.008% of

Example 162

BCH-3F.F 5.00% Clearing point [° C.]: 101 BCH-3F.F.F 8.50% Δn [589 nm,20° C.]: 0.0925 CC-3-V1 10.00% Δϵ [1 kHz, 20° C.]: 5.3 CC-4-V 12.50%ϵ_(||) [1 kHz, 20° C.]: 8.3 CCG-V-F 9.00% γ₁ [mPa · s, 20° C.]: 119CCP-2F.F.F 3.50% K₁ [pN, 20° C.]: 14.2 CCP-3-1 4.50% K₃ [pN, 20° C.]:19.9 CCP-3F.F.F 10.00% V₀ [20° C., V]: 1.73 CCP-V-1 12.00% CCP-V2-17.00% ECCP-5F.F 13.00% PUQU-3-F 5.00%

Example 163

APUQU-2-F 4.00% Clearing point [° C.]: 86.4 APUQU-3-F 6.00% Δn [589 nm,20° C.]: 0.1030 PUQU-3-F 10.00% Δϵ [1 kHz, 20° C.]: 7.0 CCQU-3-F 2.00%ϵ_(||) [1 kHz, 20° C.]: 10.1 CCP-V-1 13.00% γ₁ [mPa · s, 20° C.]: 71CCP-V2-1 7.00% K₁ [pN, 20° C.]: 13.2 PGUQU-3-F 6.00% K₃ [pN, 20° C.]:15.8 CC-3-V 40.00% V₀ [20° C., V]: 1.45 CC-3-V1 5.50% PGP-2-3 3.00%CPGP-5-2 3.00% PPGU-3-F 0.50%

Example 163a

The mixture from Example 163 is additionally mixed with 0.25% of RM-41

Example 164

Y-4O-O4 9.00% Clearing point [° C.]: 96 CY-3-O4 12.00% Δn [589 nm, 20°C.]: 0.0796 CCY-3-O1 5.00% Δϵ [1 kHz, 20° C.]: −2.3 CCY-3-O2 5.50%ϵ_(||) [1 kHz, 20° C.]: 3.4 CCY-3-O3 5.50% ϵ_(⊥) [1 kHz, 20° C.]: 5.7CC-4-V 15.00% K₁ [pN, 20° C.]: 14.8 CC-5-V 5.50% K₃ [pN, 20° C.]: 16.6CC-3-V1 6.50% V₀ [20° C., V]: 2.85 CCP-V-1 11.00% CCP-V2-1 10.00% CH-333.00% CH-35 3.00% CCPC-33 4.50% CCPC-34 4.50%

Example 165

Y-4O-O4 11.50% Clearing point [° C.]: 95 CCY-3-O1 4.00% Δn [589 nm, 20°C.]: 0.1697 CCY-3-O2 5.00% Δϵ [1 kHz, 20° C.]: −4.4 CCY-3-O3 2.50%ϵ_(||) [1 kHz, 20° C.]: 4.1 CPY-3-O2 4.00% ϵ_(⊥) [1 kHz, 20° C.]: 8.5CC-4-V 10.00% γ₁ [mPa · s, 20° C.]: 193 CCP-V-1 6.00% K₁ [pN, 20° C.]:16.8 CCP-V2-1 12.00% K₃ [pN, 20° C.]: 19.5 BCH-32 5.00% V₀ [20° C., V]:2.23 PTP-302FF 12.00% PTP-502FF 12.00% CPTP-302FF 8.00% CPTP-502FF 8.00%

Example 166

CY-3-O2 10.00% Clearing point [° C.]: 80.7 PY-1-O4 5.00% Δn [589 nm, 20°C.]: 0.1123 PY-3-O2 6.50% Δϵ [1 kHz, 20° C.]: −4.2 PY-4-O2 3.00% ϵ_(||)[1 kHz, 20° C.]: 3.8 CCY-3-O1 5.00% ϵ_(⊥) [1 kHz, 20° C.]: 8.0 CCY-3-O25.00% γ₁ [mPa · s, 20° C.]: 150 CCY-4-O2 3.00% K₁ [pN, 20° C.]: 14.6CLY-3-O2 8.00% K₃ [pN, 20° C.]: 15.2 CPY-2-O2 10.00% V₀ [20° C., V]:2.01 CPY-3-O2 10.00% CCH-301 8.50% CCH-23 12.00% CCH-34 4.50% CCH-353.00% BCH-32 6.50%

Example 167

PCH-3N.F.F 7.00% Clearing point [° C.]: 91 CP-1V-N 18.00% Δn [589 nm,20° C.]: 0.2003 CP-V2-N 16.00% Δϵ [1 kHz, 20° C.]: 10.3 CC-4-V 12.00%ϵ_(||) [1 kHz, 20° C.]: 14.3 CCP-V-1 9.00% ϵ_(⊥) [1 kHz, 20° C.]: 4.0PPTUI-3-2 18.00% PPTUI-3-4 20.00%

Example 168

BCH-32 8.00% Clearing point [° C.]: 96 CC-3-V 24.50% Δn [589 nm, 20°C.]: 0.1195 CCP-V-1 8.00% Δϵ [1 kHz, 20° C.]: −2.7 CCY-2-1 2.00% ϵ_(||)[1 kHz, 20° C.]: 3.3 CCY-3-O1 6.00% CCY-3-O3 2.00% CLY-3-O2 5.00%CLY-3-O3 5.00% CPY-2-O2 6.50% CPY-3-O2 6.00% CY-3-O2 6.00% CY-3-O4 3.00%CY-5-O2 5.00% PYP-2-3 6.50% PYP-2-4 6.50%

Example 168a

The mixture from Example 168 is additionally stabilised with

0.03% of

and mixed with0.4% of

The invention claimed is:
 1. A filling device (1) for dispensing a fluidinto at least one container, comprising a weighing scale (2), which hasat least one container positioning receptacle (4) which is adapted to acontainer diameter, where the weighing scale (2) is arranged on anaccommodation platform (7) which is movable vertically along a lineartrack (6) and where a filling-needle (3) is arranged on a displacementblock (8) in a position at a distance in the axial direction above thepositioning receptacle (4).
 2. The filling device (1) according to claim1, comprising two or more weighing scales (2), where the weighing scales(2) are each arranged on an accommodation platform (7) which is movablevertically by, in each case, one linear track (6).
 3. The filling device(1) according to claim 1, wherein the filling-needle (3) is present incombination with an inertisation needle (12).
 4. The filling device (1)according to claim 1, wherein the filling-needle (3) is arranged in aclamping block (13) which is removable from the displacement block (8).5. The filling device (1) according to claim 1, wherein components ofthe filling-needle (3) which may come into contact with the respectivefluid used during the filling operation consist of stainless steeland/or polytetrafluoroethylene (PTFE).
 6. The filling device (1)according to claim 1, wherein a membrane valve is installed upstream ofthe filling-needle (3).
 7. The filling device (1) according to claim 6,wherein a filter unit (9) is installed upstream of the membrane valve.8. The filling device (1) according to claim 1, wherein ionisers arepresent laterally, above and/or below the filling-needle (3) and arecapable of emitting a directed stream of ionised air against thefilling-needle (3).
 9. The filling device (1) according to claim 1,wherein protective walls (16) having an antistatic coating are arrangedlaterally to the filling-needle (3).
 10. The filling device (1)according to claim 1, wherein the positioning receptacle (4) has anannular shape.
 11. The filling device (1) according to claim 1, furthercomprising a drop-catching vessel (5), which is attached to a swivelarm, and which vessel is capable of being swiveled beneath thefilling-needle (3) if no container is located in the positioningreceptacle (4) or after the filling operation is complete.
 12. A methodfor dispensing a fluid into at least one container, comprisingdispensing said fluid into the at least one container by the fillingdevice (1) according to claim
 1. 13. A method for dispensing aliquid-crystal mixture, comprising dispensing said liquid-crystalmixture by the filling device (1) according to claim
 1. 14. The methodaccording to claim 12, which is carried out in a clean room.
 15. Themethod according to claim 13, which is carried out in a clean room.